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Improved system and method for automatic photomask fault detection

A photomask and mask technology, applied in the field of improved systems, can solve problems such as failure to detect photomasks

Inactive Publication Date: 2005-08-10
INFINEON TECH AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In common automated systems, a certain amount of sub-base specification features can lead to failure to inspect photomasks

Method used

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  • Improved system and method for automatic photomask fault detection
  • Improved system and method for automatic photomask fault detection
  • Improved system and method for automatic photomask fault detection

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Embodiment Construction

[0028]The invention relates to a semiconductor manufacturing device, in particular to an improved system and method for automatically detecting defects of a photomask. The method of the present invention includes a method for eliminating sub-basic specification features after comparing the reference data set with the actual features of the photomask, and also includes a system for implementing the method. In an embodiment of the present invention, the detection sensitivity is reduced , So those features smaller than the predetermined size will not be detected. In this way, the resolution of photomask detection becomes higher, because those sub-standard features are no longer discernible, and therefore will not cause detection failure. One advantage of the solution of the present invention is to establish a set of inspection data sets or design data sets, which are used as reference data to compare photomask features, and the combined features are used to control the data set, elim...

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Abstract

A method for inspecting photomasks, in accordance with present invention includes the step of providing a design data set for fabricating a photomask, searching the design data set for sub-groundrule features, eliminating the sub-groundrule features from the data set to form an inspection data set and inspecting a photomask fabricated in accordance with the design data set by employing the inspection data set. A system for executing the steps in accordance with the present invention is also provided.

Description

Technical field [0001] The present invention relates to semiconductor manufacturing equipment, and more particularly to an improved system and method for automatic fault detection of photomasks. Background technique [0002] The semiconductor manufacturing process usually includes a photolithography process for forming patterned regions on the surface of a semiconductor device. The semiconductor manufacturing process generally includes covering a photoresist material on the surface of the semiconductor device, and forming a pattern on the photoresist material by exposing the photoresist material to light, that is, crosslinking the photoresist material In particular, the light refers to violet infrared light. This cross-linking prevents reaction with a developer, because the photoresist material can no longer be cross-linked by exposure to violet infrared light if the area being developed. Other types of photoresist materials are prevented from cross-coupling when exposed to viole...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G01N21/956G03F1/84H01L21/66
CPCG03F1/84H01L22/00
Inventor S·舒泽
Owner INFINEON TECH AG