Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Treatment and prevention of abnormal scar formation in keloids and other cutaneous or internal wounds or lesions

A scar, abnormal technology, applied in the field of treatment and inhibition of abnormal scar formation, can solve the problems of side effects, seriousness, recurrence, etc.

Inactive Publication Date: 2005-09-14
CHILDRENS HOSPITAL OF LOS ANGELES +1
View PDF0 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the underlying pathological causes of scar formation are not yet recognized, these treatments exhibit severe side effects or recurrence of abnormal scarring
Therefore, there are currently no widely accepted treatments that can eliminate or prevent abnormal scarring

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Treatment and prevention of abnormal scar formation in keloids and other cutaneous or internal wounds or lesions
  • Treatment and prevention of abnormal scar formation in keloids and other cutaneous or internal wounds or lesions
  • Treatment and prevention of abnormal scar formation in keloids and other cutaneous or internal wounds or lesions

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0087] Materials and methods

[0088] cell separation : Fibroblasts come from human normal skin, scars and keloids, and adopt the method of transplantation. The skin and scar collection protocol is accredited by Children's Hospital of Los Angeles and Charles-Medical University. The raised core area of ​​the keloid is used to isolate fibroblasts. Fibroblasts were cultured in DMEM (Life Technologies, Inc., Grand Island, NY) containing 100 U / ml penicillin, 100 ug / ml streptomycin, and 10% fetal bovine serum (Life Technologies, Inc.). Cells in 5% CO 2 and 95% air in a humidified incubator. Fibroblasts were digested and passaged in Hank's solution (Life Technologies) containing 0.05% ethylenediaminetetraacetic acid and 0.25% trypsin once a week. Cells of passage 2-10 were used in the experiments. Cell passaging was defined as weekly expansion from primary cultures. The source of each fibroblast strain used in the present invention is listed in Table 1. These samples repre...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to findings that reducing the activity of Plasminogen Activator Inhibitor-1 (PAI-1) suppresses an excessive deposition of collagen which is known as a cause for the formation of abnormal scars. These abnormal scars include but are not limited to keloids, adhesions, hypertrophic scars, skin disfiguring conditions, fibrosis, fibrocystic conditions, contractures, and scleroderma, all of which are associated with or caused by an excessive deposit of collagen in a wound healing process. Accordingly, aspects of the present invention are directed to the reduction of PAI-1 activity to decrease an excessive accumulation of collagen, prevent the formation of an abnormal scar, and / or treat abnormal scars that result from an excessive accumulation of collagen. The PAI-1 activity can be reduced by PAI-1 inhibitors which include but are not limited to PAI-1 neutralizing antibodies, diketopiperazine based compounds, tetramic acid based compounds, hydroxyquinolinone based compounds, Enalapril, Eprosartan, Troglitazone, Vitamin C, Vitamin E, Mifepristone (RU486), and Spironolactone to name a few. Another aspect of the present invention is directed to methods of measuring PAI-1 activity in a wound healing process and determining the propensity of the formation of an abnormal scar.

Description

[0001] related application [0002] This application is based upon and claims the benefit of priority from US Provisional Application No. 60 / 380,696, filed March 13, 2002, and contains the entire contents thereof including the accompanying drawings. [0003] Government funding [0004] This invention was made with a grant from the National Academy of General Medicine (GM55081), and thus the US Government has certain rights in this invention in certain respects. field of invention [0005] The present invention relates to the treatment and inhibition of abnormal scar formation, and more particularly, the present invention relates to reducing the activity of plasminogen activator inhibitor-1 during wound healing to reduce the excessive deposition of collagen, which can be Causes abnormal scarring, including keloids, hypertrophic scars, adhesions, and other skin or internal trauma or damage. Background of the invention [0006] Wound healing is a continuous process that can g...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K31/355A61K31/401A61K31/495A61K31/56A61K31/58A61K38/00C07K16/18
CPCA61K31/495A61K31/355A61K38/005A61K31/58A61K2039/505C07K16/18A61K31/401A61K31/56A61P17/02A61P21/00
Inventor 段泰岚保罗·D·本亚大卫·沃伯顿
Owner CHILDRENS HOSPITAL OF LOS ANGELES
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com