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Semiconductor memory device

A memory and semiconductor technology, applied in the direction of semiconductor devices, static memory, electric solid-state devices, etc., can solve the problems of small tunnel current and large resistance of MTJ components

Inactive Publication Date: 2006-06-07
KK TOSHIBA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Conversely, if the spins are antiparallel, the tunneling current is smaller and thus the MTJ element has a larger resistance

Method used

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  • Semiconductor memory device
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  • Semiconductor memory device

Examples

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no. 1 example

[0046] figure 1 The structure of the semiconductor memory device common to the embodiments of the present invention is schematically shown. figure 1 A memory cell array extracted from a semiconductor memory device and a circuit related to writing are shown. Such as figure 1 As shown, the semiconductor memory device has a memory cell array MCA. As will be discussed in detail later, the memory cell array MCA has a plurality of MTJ elements MTJ, a plurality of write bit lines WBL extending in the x direction (horizontal direction in the drawing), and a plurality of writing bit lines WBL extending in the y direction (vertical direction in the drawing). multiple write word lines WWL. The figure shows only one MTJ element MTJ, one write bit line, and one write word line.

[0047] The MTJ element MTJ may have any structure as long as the MTJ element MTJ can at least store binary data according to a magnetic field applied to the MTJ element MTJ. Such as Figure 58As shown, a str...

no. 2 example

[0068] The second embodiment relates to a method of flowing current through a write line of the semiconductor memory device according to the first embodiment.

[0069] Below, will refer to Figure 8 and 9 , to describe the second embodiment. As an example, the following description corresponds to the figure 2 In the structure of the first embodiment shown, data is written to the MTJ element MTJ located on the left side of the connection line CONWBL. More specifically, as an example of this case, writing is performed on the MTJ element (selected MTJ element) passed by the second write bit line WBL from the top of the drawing.

[0070] Figure 8 and 9 Schematically shows the state of important components during writing according to the second embodiment of the present invention. especially in Figure 8 , the write current flows to the right in the figure through the write bit line (selected write bit line) WBL through the selected MTJ element. exist Figure 9 , the wri...

no. 3 example

[0094] In the third embodiment, in addition to the control of the second embodiment, control is performed so that no current flows in the write line portion adjacent to the selected write line adjacent to the selected MTJ element.

[0095] Figure 12 and 13 Each schematically shows states of important parts of the semiconductor memory device according to the third embodiment during writing. exist Figure 12 , the write current flows to the right in the figure through the selected write bit line WBL. The selected write bit line is the second written bit line from the top of the figure. Figure 12 Corresponds to such as Figure 8 The state of the second embodiment is shown. exist Figure 13 , the write current flows to the left in the figure through the selected write bit line WBL. Figure 13 Corresponds to such as Figure 9 The state of the second embodiment is shown.

[0096] Such as Figure 12 As shown, in the write bit line current circuit connected to the write line...

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Abstract

A semiconductor MRAM device includes a plurality of memory cells (MTJ) using a current flowing through a wiring. A plurality of first write lines (WBL) are electrically or magnetically or electrically and magnetically connected to the memory cells and provided along a first direction. A first connection line (CONWBL) electrically connects at least two of the first write lines each other.

Description

technical field [0001] The present invention relates to a semiconductor memory device that performs a write operation using an electric current, for example, to an arrangement of a write line and a wire configuration in a Magnetic Random Access Memory (MRAM). Background technique [0002] MRAM (see, eg, "IEEE Journal of Solid-State Circuits", May 2003, Vol. 38, No. 5, pp. 769-773) is a memory that stores data using the magnetoresistance effect. In conventional flash memories, etc., data is written using voltage. On the other hand, in MRAM, data is written using an electric current. [0003] A magnetic tunnel junction (MTJ) element used in an MRAM utilizes a tunnel magnetoresistance effect. An MTJ element generally has an insulating layer and two ferromagnetic layers sandwiching the insulating layer therebetween. One of the ferromagnetic layers, called the reference layer, has a fixed magnetization direction. The other ferromagnetic layer is called the recording layer, an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/10G11C11/15
CPCG11C5/063G11C7/12G11C7/18G11C8/08G11C8/14G11C11/161G11C11/1675
Inventor 稻场恒夫
Owner KK TOSHIBA
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