Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Apparatus for substrate marking

A substrate and linear technology, applied in the field of substrate scribing devices, can solve problems such as difficulty in forming accurate scribing lines

Inactive Publication Date: 2011-06-08
TOP ENG CO LTD
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, if image 3 As shown, when the wheel 26 travels along different driving directions, for example as image 3 "A" direction or "B" direction shown, due to pressurization force W 1 and W 2 The resulting friction force V 1 and V 2 Generated repulsion X 1 and x 2 , and the repulsion X 1 and x 2 Generates an unplanned momentary force M, making it difficult to form a precise line

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Apparatus for substrate marking
  • Apparatus for substrate marking
  • Apparatus for substrate marking

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0040] The present invention will be described more fully hereinafter with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. However, this invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. The embodiments are, of course, provided as teaching examples of the invention. The same reference numerals denote the same elements.

[0041] Figure 4 is a front view for explaining the structure of an apparatus for scribing a substrate according to an embodiment of the present invention, and Figure 5 is an exemplary diagram for explaining a driving state of an apparatus for scribing a substrate according to an embodiment of the present invention.

[0042] Such as Figure 4 As shown, the device for scribing a substrate includes: a wheel 46 for forming a scribe line on a substrate 50; Pressing part; Lifting head 44, VCM 45 is installed at the lifting head 44; Servo m...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An apparatus for substrate scribing which can apply scribing force vertically on a substrate is provided. The apparatus comprises a line-forming part for scribing a line on the substrate, a pressing part for applying pressure on the line-forming part, an elevator for moving the pressing part up and down, an elevating guiding part for leading the elevator, and a pressing guiding part for leading the pressure part. According to the invention, a scribed line can be formed on the substrate precisely by solving the eccentric force which deviates to the X-Y direction.

Description

[0001] Related Application Cross Reference [0002] This application claims the benefit of Korean Patent Application No. 10-2006-0034973 filed Apr. 18, 2006, the disclosure of which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to a device for scribing a substrate, in particular to such a device for scribing a substrate comprising a head for scribing so that the force of the scribing acts perpendicularly on the substrate department. Background technique [0004] Generally, a glass substrate for a display is manufactured in a large size, which is then cut and processed into an appropriate size for use. [0005] The process of cutting a brittle material such as a glass substrate is performed by a scribing process of forming a cutting line on the surface of the glass substrate by a tool composed of a diamond material having a hardness greater than that of the glass substrate; The substrate is a cutting process of c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C03B33/02C03B33/033
CPCC03B33/033G02F1/1303H01L22/32H01L31/18
Inventor 金永敏孙志英
Owner TOP ENG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products