Method and apparatus for assisting laser material processing
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[0025]FIG. 1 generally illustrates an apparatus for assisting laser material processing according to the invention. The apparatus shown at FIG. 1 includes an exposure source 20 such as a laser for generating a beam of radiation at wavelengths less than 1100 nm, although longer wavelength radiation sources may be used and benefit from use with the preferred embodiments. It is important that the wavelength of the laser radiation is highly transmissive for the liquid being used as the assist material. In the case of far infrared sources, e.g., carbon dioxide (CO2) lasers emitting around 10.6 microns, a liquid gas like N2, Ar, CO2 and the like may be used as the assist material to aid the laser machining where simple liquids like water strongly absorb the radiation. The repetition rate may be as low as a few Hz or may be operated in cw mode, although operating at higher repetition rates such as 1 kHz or more, the low thickness water layer preferred herein is particularly advantageous as...
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