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Method for forming patterned doping regions

a technology of solar cells and patterned doping, which is applied in the field of solar cell patterned doping regions, can solve the problems of increasing the cost of solar cells, high manufacturing cost, and complicated process for forming patterned doping regions

Active Publication Date: 2015-06-11
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this solar cell has a good conversion efficiency, it has a very high manufacturing cost due to its requiring many high-temperature and photolithography processes.
However, the process for forming patterned doping regions is more complicated and requires a highly accurate process, such as lithography, thus increasing the cost of the solar cell.

Method used

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  • Method for forming patterned doping regions
  • Method for forming patterned doping regions
  • Method for forming patterned doping regions

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Embodiment Construction

[0016]In the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a through understanding of the disclosed embodiments. It will be apparent, however, that one or more embodiments may be practiced without these specific details. In other instances, well-known structures and devices are schematically shown in order to simplify the drawing.

[0017]An embodiment of the disclosure forms p-type or n-type patterned doping regions using a coating of phosphoric acid or boric acid. The embodiment uses screen printing to take off photolithography and further uses a coating layer to avoid the spread of coated phosphoric acid or boric acid. An embodiment of the disclosure can use a single thermal diffusing step to get a p-type pattern region or an n-type pattern region.

[0018]A method for forming a structure comprising p-type regions and n-type regions is illustrated FIG. 1A˜FIG. 1G. In an embodiment of the disclosure, the p-type a...

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Abstract

A method for forming doping regions is disclosed, including providing a substrate, forming a first-type doping material on the substrate and forming a second-type doping material on the substrate, wherein the first-type doping material is separated from the second-type doping material by a gap; forming a covering layer to cover the substrate, the first-type doping material and the second-type doping material; and performing a thermal diffusion process to diffuse the first-type doping material and the second-type doping material into the substrate.

Description

CROSS-REFERENCE TO RELATED APPLICATION[0001]This application is a divisional of U.S. application Ser. No. 13 / 710,795, filed on Dec. 11, 2012, which claims priority of Taiwan Patent Application No. 101135229, filed on Sep. 26, 2012, the entireties of which are incorporated by reference herein.BACKGROUND[0002]1. Technical Field[0003]The technical field relates to a method for forming patterned doping regions, and more particularly to a method for forming patterned doping regions of a solar cell.[0004]2. Description of the Related Art[0005]In recent years, due to rise of environmental protection and global warming, the green industry has been greatly developed. Solar cells are a major technology in the green industry. Methods for developing a high efficiency, low-cost solar cell have become an important focus of research. Solar cells can be disposed on buildings, such as houses, and movable apparatus, such as cars; indoors, or on portable electric devices, to convert light into electri...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L21/225H01L31/18
CPCH01L31/18H01L21/225H01L21/2255H01L31/068H01L31/1804Y02E10/547Y02P70/50H01L21/22
Inventor SUN, WEN-CHINGYU, SHENG-MINWANG, TAI-JUILIN, TZER-SHEN
Owner IND TECH RES INST