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Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense system

Inactive Publication Date: 2015-11-19
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent describes a machine that can apply a coating of photoresist liquid to a wafer and then develop it. This machine can help reduce defects in the wafer that may occur during the printing process.

Problems solved by technology

When a process liquid containing bubbles or particles is supplied to a wafer, application non-uniformity and / or defect may occur.

Method used

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  • Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense system
  • Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense system
  • Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense system

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Embodiment Construction

[0023]A coating and developing apparatus may be used for coating a wafer with a photoresist liquid and subsequently developing the wafer. Systems and methods described herein may lower photoresist printed wafer defectivity, such as defectivity associated with micro-bridging defects, by providing continuous resist movement (to prevent agglomeration of resist components, etc.) and high filtration number (Fn), where Fn is the effective number of times that the photoresist has been filtered (i.e., pushed or pulled through a filter) on the track.

[0024]As shown in FIGS. 1 and 2, an example coating and developing apparatus may include a carrier station 1 through which a carrier 10, which may hermetically contain a plurality of (e.g., twenty five) wafers W as substrates to be processed, may be loaded and unloaded; a processing part 2 that may be configured to perform a resist coating process, a developing process, and so on to a wafer W taken out from the carrier station 1; an exposure part...

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Abstract

An apparatus for dispensing a liquid onto a substrate may comprise a reservoir for storing the liquid to be dispensed; a filter comprising an inlet and an outlet, the filter inlet in fluidic communication with the reservoir via a first valve; a dosing pump comprising an inlet, a first outlet, and a second outlet, the dosing pump inlet in fluidic communication with the reservoir and the dosing pump second outlet in fluidic communication with the filter inlet via a second valve, the dosing pump configured to dose an amount of the liquid and pump the liquid; and a dispense nozzle in fluidic communication with the dosing pump first outlet, the dispense nozzle configured to dispense the liquid onto the substrate.

Description

CROSS-REFERENCE TO RELATED APPLICATION[0001]This disclosure claims priority from U.S. Provisional Application No. 61 / 993,856, entitled “Apparatus for Increased Recirculation and Filtration in a Photoresist Dispense System” and filed May 15, 2014, the entirety of which is incorporated by reference herein.BACKGROUND[0002]In a photolithographic technique for manufacturing semiconductor devices, a photoresist liquid is applied to a semiconductor wafer or a substrate to form a resist film exposed in accordance with a predetermined circuit pattern, and the exposed pattern is developed so that a circuit pattern is formed in the resist film. There is a possibility that bubbles of nitrogen gas or particles (foreign matter) might come to be mixed in a process liquid such as a photoresist liquid. When a process liquid containing bubbles or particles is supplied to a wafer, application non-uniformity and / or defect may occur. Thus, a liquid processing apparatus for supplying a process liquid to ...

Claims

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Application Information

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IPC IPC(8): B05B7/26B05B15/00H01L21/027B05B12/00
CPCB05B7/26B05B12/006H01L21/0274B05B15/008B05B15/002G03F7/162B05B15/20G03F7/16B05C11/1013B01D19/0031B01D37/00
Inventor CARCASI, MICHAEL ANDREWPRINTZ, WALLACE PAULHOOGE, JOSHUA STEVEN
Owner TOKYO ELECTRON LTD
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