Manufacturing method for solid electrolytic capacitor
A technology of solid electrolysis and manufacturing method, which is applied in the direction of solid electrolytic capacitors, electrolytic capacitors, capacitors, etc., and can solve problems such as enlargement and deterioration of high-frequency response characteristics
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Embodiment approach 1
[0042]Embodiment 1 of the present invention will be described with reference to FIGS. 1 to 14 . 1 is a perspective view of a solid electrolytic capacitor in Embodiment 1 of the present invention, FIG. 2 is a cross-sectional view of the solid electrolytic capacitor in Embodiment 1 of the present invention, and FIG. 3 is an enlarged cross-sectional view of main parts thereof.
[0043] First, the structure of the chip capacitor element 1 of the present invention will be described in order of manufacturing steps. One side of the aluminum foil 2 is etched, and the resist film 4 is formed on the porous portion of the multiplied aluminum foil 2 (hereinafter referred to as the porous portion 3 ). Next, a through hole 5 is formed at a predetermined position of the aluminum foil 2, and an insulating film 6 is formed on the surface of the aluminum foil 2 that is not made porous (hereinafter referred to as a flat surface) and the inner wall of the through hole 5, and the resist film 4 is ...
Embodiment approach 2
[0062] Next, Embodiment 2 of the present invention will be described with reference to FIGS. 15 to 16 . 15 to 16 are main process diagrams for explaining the manufacturing process of the solid electrolytic capacitor in Embodiment 2 of the present invention.
[0063] After the resist film 4 is formed on the porous portion 3 of the aluminum foil 2 made porous on one side by etching, the through hole 5 is formed at a predetermined position. Next, an insulating film 6 is formed on the non-porous surface of the aluminum foil 2 (hereinafter referred to as a flat surface) and the inner wall of the through hole 5, and then, after removing the resist film 4, a dielectric film is formed on the porous portion 3. Body capsule7. The above steps are the same as the method of Embodiment 1.
[0064] Next, when the solid electrolyte layer 8 is provided on the dielectric film 7, the solid electrolyte layer 8 may be formed on the insulating film 6 on the flat surface of the aluminum foil 2 whe...
Embodiment approach 3
[0070] Embodiment 3 of the present invention will be specifically described below with reference to FIGS. 17 to 18 . 17 to 18 are main process diagrams for explaining the manufacturing process of the solid electrolytic capacitor in Embodiment 3 of the present invention.
[0071] After the resist film 4 is formed on the porous portion 3 of the aluminum foil 2 multiplied on one side by etching, a through hole 5 is formed at a predetermined position. Next, an insulating film 6 is formed on the non-porous surface of the aluminum foil 2 (hereinafter referred to as a flat surface) and the inner wall of the through hole 5, and after removing the resist film 4, a dielectric film 7 is formed on the porous portion 3. . The above steps are the same as those in Embodiment 1.
[0072] Next, the solid electrolyte layer 8 is provided on the dielectric film 7, and the solid electrolyte layer 8 may be formed on the insulating film 6 on the flat surface of the aluminum foil 2 when the via hol...
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