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Method and apparatus for manufacturing thin film transistor array

A technology of thin-film transistors and manufacturing methods, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of unguaranteed, difficult maintenance, high cost, etc., to eliminate electrostatic damage, strengthen bearing capacity, and improve production The effect of yield

Inactive Publication Date: 2008-09-24
TPO DISPLAY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the above-mentioned static eliminators often wear out after a period of use because the probes of the static eliminators are consumables. Not only are maintenance and repairs difficult, but also static detectors must be used for calibration frequently, resulting in too much cost. high
Moreover, most static eliminators will supply excessive positive or negative ions, causing the target object to be charged with reverse polarity
In addition, since some of the thin film transistor manufacturing processes are high-temperature processes (process temperature > 500°C), and static eliminators cannot operate at high temperatures for a long time, there is no guarantee that they will not be affected by static electricity during high-temperature processes.

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  • Method and apparatus for manufacturing thin film transistor array
  • Method and apparatus for manufacturing thin film transistor array
  • Method and apparatus for manufacturing thin film transistor array

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Embodiment Construction

[0021] figure 1 It is a flow diagram of the manufacturing process of a thin film transistor (thin film transistor, TFT for short) array (array) according to a preferred embodiment of the present invention, wherein each conductor layer is manufactured by a two-stage photomask process, and each The one-stage photomask process includes, for example, photoresist coating, soft baking, hard baking, exposure, fixing, development, etching and other steps to pattern the conductor layer.

[0022] Please refer to figure 1 , in step 100, a substrate is provided, and the substrate is a transparent substrate, such as a glass substrate or a quartz substrate. Next, in step 102, an nth conductor layer is formed on the substrate, where n=1, 2, . It is the conductive layer that will be destroyed by static electricity, and it can be made according to the method of this embodiment.

[0023] Subsequently, in step 104 , the nth conductor layer is patterned by a first-stage photomask process to fo...

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Abstract

The invention discloses a method and device for manufacturing thin film transistor array, applied to the step of forming conductor layer in the manufacturing process of the thin film transistor array and adopting a two-stage shade manufacturing process: firstly, using the first-stage shade manufacturing process to patternize the conductor layer formed on a substrate so as to form a firs pattern comprising several independent circuits and connectors connecting these circuits to make the same conductor layer equipotential and able to make point discharge mechanism on the edge of the substrate; then, before composing the next conductor layer, using the second-stage shade manufacturing process to eliminate all the connectors of the first pattern so as to form a second pattern which only retains the said circuits.

Description

technical field [0001] The present invention relates to a manufacturing method of a thin film transistor array (thin film transistor array, referred to as TFT array), and in particular to a manufacturing method of a thin film transistor array capable of eliminating electrostatic discharge (abbreviated as ESD). Background technique [0002] Liquid crystal displays have advantages that cannot be achieved by displays made of traditional cathode ray tubes (CRT), such as low-voltage operation, no radiation scattering, light weight, and small size. Compared with other flat-panel displays such as plasma displays and Electroluminance (electroluminance) displays have become the main subject of display research in recent years, and are even regarded as the mainstream of displays in the 21st century. [0003] In the active matrix liquid crystal display, active elements such as transistors or diodes are directly formed at the pixel electrodes to control the data writing of the liquid cr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00G02F1/136
Inventor 陈志宏林国隆陈志芳
Owner TPO DISPLAY