Gray mask and method for manufacturing gray mask
A technology of gray-tone mask and manufacturing method, which is applied in the photolithographic process of patterned surface, semiconductor/solid-state device manufacturing, and original parts for photomechanical processing, etc., which can solve the problems of different design values, TFT substrate characteristic changes, and No problems such as gray tone masking can be avoided, and the effect of good graphics accuracy can be achieved
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[0072] Hereinafter, the present invention will be described in detail through embodiments.
[0073] figure 1 It is a cross-sectional view showing the vicinity of a source electrode and a drain electrode on a TFT substrate of a gray tone mask according to Embodiment 1 of the present invention, figure 2 (a) is figure 1 Enlarged view of the part surrounded by the dashed line in .
[0074] Such as figure 1 and figure 2 As shown, in this embodiment, on the transparent substrate 11 such as quartz, as the opposing portion of the source electrode and the drain electrode, a light-shielding film pattern 13a is formed in the region adjacent to the channel portion, and the source electrode and the drain electrode are connected to the channel portion. In the adjacent part of the track part, except for the margin region 17 on the electrode side, the region on the light-shielding film and the source electrode and the drain electrode part are formed with a semi-transparent film patte...
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