Method for on-line fault diagnosis of etching equipment
A technology for etching equipment and fault diagnosis, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as equipment maintenance sensitivity, difficulty in application, and complexity, achieve sensitive fault monitoring, improve applicability, and avoid complexity. degree of effect
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[0033] A preferred embodiment of the present invention is, firstly, select a plurality of parameters in the process, and perform mathematical operations on the multiple parameters in the process to obtain new parameters, the amount of change of the new parameters is more obvious than the amount of change of a single parameter ; Then, set the control limit as required, and judge the operating state of the etching equipment according to the new parameter and the control limit; if the new parameter value exceeds the control limit, it is judged that the etching equipment is in a fault state.
[0034] Such as Figure 2(a) , 2(b) , 2(c), select the first parameter and the second parameter, where the first parameter decreases with the increase in the number of silicon wafers processed, assuming that this decrease is a fault state, it is necessary to increase its variation for early Fault states are found and processed to avoid scrapping silicon wafers. At this time, a second parame...
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