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Lithographic apparatus, reticle exchange unit and device manufacturing method

A technology of photolithography equipment and switching units, which is applied in the field of device manufacturing, can solve problems such as the deformation of the spatial relationship between the thin film and the reticle, and achieve the effect of reducing the risk of damaging the thin film and reducing the risk

Active Publication Date: 2009-12-16
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Another problem associated with the flow of purge gas from one side of the membrane to the other is the possible different dynamics on the different sides attached to the membrane frame, which can lead to distortions in the spatial relationship between the membrane and the reticle

Method used

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  • Lithographic apparatus, reticle exchange unit and device manufacturing method
  • Lithographic apparatus, reticle exchange unit and device manufacturing method
  • Lithographic apparatus, reticle exchange unit and device manufacturing method

Examples

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Embodiment Construction

[0035] figure 1 A lithographic apparatus according to a particular embodiment of the invention is schematically represented. The apparatus comprises: an illumination system (illuminator) IL for providing a projected beam B of radiation (e.g. UV radiation); for supporting a patterning device (e.g. a mask) MA and for precisely positioning the patterning device relative to the part PS A first support structure (e.g., a mask table) MT connected to a first positioner PM for holding a substrate (e.g., a resist-coated wafer) W and a second support structure for precisely positioning the substrate relative to the part PS a substrate table (e.g., a wafer table) WT to which the positioner PW is connected; and a projection system for imaging the pattern imparted to the projection beam B by the patterning device MA onto a target portion C of the substrate W (e.g., comprising one or more dies) (eg refractive projection lens) PS.

[0036] As described herein, the device is transmissive (e...

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PUM

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Abstract

A reticle exchange unit for moving a reticle in a lithographic apparatus is disclosed. The surface of the reticle is protected by a membrane attached to it by a gas permeable membrane frame. The reticle exchange unit includes a reticle preparation chamber, a reticle transport unit arranged so that the plurality of exposed gas permeable portions of the film frame face the interior of the reticle preparation chamber, and purge gas pressure and exhaust pressure supplies Constructed to be connected to the reticle preparation chamber and arranged to alternately provide purge gas pressure and exhaust pressure lower than the purge gas pressure to when the exposed gas permeable portion of the membrane frame faces the interior of the reticle preparation chamber The reticle prepares the cavity so that gas flows through the film frame alternately into and out of the film space between the film and the reticle.

Description

technical field [0001] The invention relates to a photolithographic equipment, a reticle exchange unit, and a device manufacturing method. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a target portion of a substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, such as a reticle, can be used to generate a circuit pattern corresponding to the individual layers of the IC, which can be imaged onto a substrate (such as a silicon wafer) with a layer of radiation-sensitive material (resist) On a target portion (eg, comprising a portion, one or more dies) of a target. Typically, a single substrate will contain a grid of adjacent target portions exposed sequentially. Known lithographic apparatuses include so-called steppers, in which each target portion is irradiated by exposing the entire pattern on the target portion at once, and so-...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F1/14H01L21/027
CPCG03F7/70933G03F7/70741G03F1/64G03F7/70983G03F7/70866
Inventor N·坦卡特
Owner ASML NETHERLANDS BV