Organic luminescence display device and method for preparing the same
A display device and luminescence technology, which is applied in the direction of electroluminescence light source, organic semiconductor device, electric solid device, etc., and can solve the problem that emission defects cannot be prevented
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Embodiment 1
[0071] 15Ω / cm manufactured by Corning Inc. (Corning, NY) 2 (1200 Ȧ) ITO glass substrates were cut into 50mm x 50mm x 0.7mm pieces, and each piece was ultrasonically cleaned in isopropanol and deionized water for 5 minutes, followed by UV / ozone cleaning for 30 minutes to form the anode.
[0072] On this substrate, m-MTDATA was vacuum deposited to form a HIL with a thickness of 500 Ȧ. Hexanitrile hexaazatriphenylene was deposited by resistance heating on the HIL to form a charge generation layer with a thickness of 20 Ȧ. N,N'-bis(1-naphthyl)-N,N'-diphenylbenzidine (α-NPD) was vacuum-deposited on the charge generation layer to form a hole transport layer with a thickness of 200 Ȧ.
[0073] Vacuum deposition using organic vapor phase deposition (OVPD) was performed to form an EML with a thickness of about 300 Ȧ. Alq3 as an electron transport layer material was deposited on the EML to form an ETL with a thickness of about 300 Ȧ. LiF is vacuum deposited on the electron transport ...
Embodiment 2
[0075] This organic EL display device was produced in the same manner as in Example 1, except that the thickness of the charge generation layer was 50 Ȧ.
Embodiment 3
[0077] This organic EL display device was fabricated in the same manner as in Example 1, except that the thickness of the charge generation layer was 80 Ȧ.
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