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Substrate transporting mechanism, substrate transporting method and substrate processing system

A substrate handling and substrate technology, used in transportation and packaging, lighting and heating equipment, furnace components, etc., can solve problems such as particle and gas discharge, reduce particle and gas emissions, simplify structure, and eliminate mechanical contact and friction Effect

Inactive Publication Date: 2008-01-02
FUTURE VISION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the conventional driving force transmission method, when transmitting the rotational driving force into a vacuum, sealing packing and magnetic fluid are used on the rotating shaft, and there is a problem that particles and gas from these components are discharged.

Method used

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  • Substrate transporting mechanism, substrate transporting method and substrate processing system
  • Substrate transporting mechanism, substrate transporting method and substrate processing system
  • Substrate transporting mechanism, substrate transporting method and substrate processing system

Examples

Experimental program
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Embodiment 1

[0025] An example of the substrate processing system of the present invention will be described with reference to FIG. 1 . The LCD glass substrate processing system 1 shown in FIG. 1 has an LCD glass substrate (hereinafter simply referred to as "substrate") L carried into the processing system and carried out after the processing is completed. The loading and unloading device 10 processes the substrate under atmospheric pressure. Atmospheric processing apparatus 20·21, vacuum processing apparatus 30 for processing the substrate L under reduced pressure, loading and unloading apparatus 10, atmospheric processing apparatus 20·21 and vacuum processing apparatus 30 are connected and the substrate The conveyance system 40 which conveys L is comprised. Air-based processing equipment includes, for example, cleaning equipment, coating and developing equipment, and exposure equipment, and vacuum-based processing equipment includes etching equipment, film-forming equipment, and ion impl...

Embodiment 2

[0043] Next, referring to FIG. 4, the vacuum system processing apparatus 30 will be described in detail. FIG. 4 is a schematic diagram of a processing apparatus 30 for performing film formation processing on a substrate L. As shown in FIG. The processing device is composed of three chambers, namely, a fixed chamber 31 , a transfer chamber 33 and a processing chamber 35 .

[0044] In FIG. 4 , the loading and fixing chamber 31 has the function of repeatedly performing depressurization and return to normal pressure so that the substrate L can be carried in from the atmosphere through the first gate valve G1 . The loading and fixing chamber 31 is connected to the transfer chamber 33 through the second gate valve G2, and the transfer chamber 33 and the processing chamber 35 are connected through the third gate valve G3. The transfer chamber 33 has a function of carrying in and carrying out the substrate L by the transfer arm 34 while maintaining the pressure of the processing cham...

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PUM

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Abstract

The present invention provides a substrate transporting mechanism and a substrate transporting method, in which driving force can be separated or combined together without using a mechanical synchronizing mechanism such as gear. A substrate transporting mechanism in a chamber 31 comprises a fixed stage 310 and a movable stage 320 . On the movable stage 320 , a first, a second, and a third driven magnets 331, 332 , and 333 are supported by bearing units 322 . These driven magnets are magnetically coupled with each other, and the third driven magnet 333 is magnetically coupled with the roller magnet 323 . Further, the first driven magnet 331 is magnetically coupled with the driving magnet 330 , and the driving force from the driving magnet 330 can be separated or combined.

Description

technical field [0001] The present invention relates to a substrate conveying device used for conveying substrates such as glass substrates of liquid crystal display (LCD) panels, a substrate conveying method, and a substrate processing system utilizing such substrate conveying. Background technique [0002] Currently, in a general processing system for semiconductor substrates and LCD glass substrates, a plurality of processing devices such as coating and developing processing devices and etching devices are arranged in parallel with respect to the transfer system. Some of the transfer systems in such an LCD glass substrate processing system have a function of transferring the substrate under vacuum (or under reduced pressure) in order to transfer the substrate into and out of the vacuum system processing apparatus. [0003] This transfer device uses conveyor belts (material: metal and synthetic rubber) and gears to transmit power in a vacuum chamber, and transfers substrat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B65G49/06B65G49/07B65G37/00G02F1/1333H01L21/677
CPCH01L21/67236B65G49/064B65G2249/02H01L21/67201H01L21/67709H01L21/67736B65G49/067
Inventor 堀口贵弘
Owner FUTURE VISION