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Lithographic apparatus and method

A lithography equipment and lithography technology, applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve expensive, time-consuming, and costly problems

Active Publication Date: 2011-02-16
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem with this approach is that it may require major modifications to conventional lithographic equipment, which is both costly and time consuming
The problem associated with this approach is that it may also require major modifications to conventional lithographic equipment, especially for the substrate support table, but also the design and manufacture of the support table to be watertight and have the required flatness is complex and expensive

Method used

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  • Lithographic apparatus and method
  • Lithographic apparatus and method
  • Lithographic apparatus and method

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Embodiment Construction

[0013] Although specific reference may be made herein to the use of the lithographic apparatus in the fabrication of ICs, it should be understood that the lithographic apparatus described herein may have other applications, such as integrated optical systems, magnetic domain memory guidance and Manufacture of detection patterns, liquid crystal displays, thin-film magnetic heads, etc. It will be understood by those of ordinary skill that, in the context of this alternative application, any term "wafer" or "die" used therein may be considered to be synonymous with the more general term "substrate" or "die", respectively. "Target section" is synonymous. The substrate referred to here can be processed before or after exposure, such as in a track (a tool that typically applies a layer of resist to a substrate and develops the exposed resist), metrology tools and / or in the inspection tool. Where applicable, the disclosure may be applied in this and other substrate processing tools...

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Abstract

A lithographic apparatus includes an illumination system constructed and arranged to condition a beam of radiation, and a support structure constructed and arranged to support a patterning device. The patterning device is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table constructed and arranged to hold a substrate. The substrate table includes a substrate support plate that is in thermal contact with a thermal conditioning plate. The apparatus further includes a projection system constructed and arranged to project the patterned beam of radiation onto a target portion of the substrate. A lithograohic method is also disclosed.

Description

technical field [0001] The present invention relates to a lithographic apparatus and method. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern onto a target portion of a substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate a circuit pattern corresponding to a single layer of the IC. The pattern can be imaged onto a target portion (eg, a portion including a portion of a die, one or more dies) on a substrate (eg, a silicon wafer). The substrate has a layer of radiation-sensitive material (resist). Typically, a single substrate will contain a network of adjacent target portions that are sequentially exposed. Known lithographic apparatuses include: so-called steppers, in which each target portion is irradiated by exposing the entire pattern onto the target portion at ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCH01L21/67103G03F7/70875G03F7/707H01L21/67005
Inventor 克里斯蒂恩·亚历山大·胡根旦姆弗朗西斯克斯·约翰尼斯·约瑟夫·詹森
Owner ASML NETHERLANDS BV