Method and device for preparing polysilicon thin-film solar battery

A polycrystalline silicon thin film and solar cell technology, which is applied in circuits, electrical components, and final product manufacturing, etc., can solve the problems of difficulty in further improving the efficiency of amorphous silicon thin film solar cells, low photoelectric conversion efficiency, and low carrier mobility, etc. Achieve the effects of high photoelectric conversion efficiency, low cost, and reduced crystal growth rate

Inactive Publication Date: 2008-12-17
东莞晨真光伏有限公司
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  • Summary
  • Abstract
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  • Application Information

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Problems solved by technology

Due to the limitation of the higher defect state density (~10 16 cm -3 ) and low carrier mobility (less than ~1cm 2 / Vs), photogenerated carriers are very easy to recombine, and the photoelectric conversion efficiency of amorphous silicon thin film solar cells and amorphous silicon / microcrystalline silicon stacked solar cells is very low, the former is only ~6%, and the latter is only ~8%.
These essential problems make it difficult to further improve the efficiency of amorphous silicon thin film solar cells

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Embodiment Construction

[0033] The invention prepares a high-quality amorphous silicon film on a substrate at a lower temperature and at a lower cost, crystallizes the amorphous silicon film grown on the substrate into a polysilicon film, avoids the harsh process conditions of directly growing a polysilicon film, and further prepares Polycrystalline silicon thin film solar cells. The invention not only reduces the cost of producing solar cells, but also improves the photoelectric conversion efficiency.

[0034] figure 2 Show the method for preparing polysilicon film among the present invention, comprise the following steps:

[0035] In step 110, a substrate is provided, which may be a glass substrate.

[0036] In step 120, a buffer layer is deposited on the substrate, and the buffer layer may be a transparent conductive oxide film.

[0037] In step 130, an amorphous silicon film is deposited on the buffer layer.

[0038] In step 140, the amorphous silicon thin film is irradiated to reach the mel...

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Abstract

The invention provides a method for preparing polycrystalline silicon thin-film solar cell and a device thereof. The method comprises the steps of providing a substrate; depositing a front electrode and conducting etching on the substrate; depositing a non-crystalline silicon film on the front electrode; irradiating the non-crystalline silicon film to allow the non-crystalline silicon film to reach the melting point temperature thereof until the non-crystalline silicon film is melted to formed a molten layer with a certain depth; reducing the temperature difference between the non-crystalline silicon film and the substrate when the non-crystalline silicon film crystallizes, so as to obtain a polycrystalline silicon film with larger crystal grains; etching the polycrystalline silicon film; depositing a back electrode on the polycrystalline silicon film; etching the polycrystalline silicon film and the back electrode; and packaging the substrate, the front electrode, the polycrystalline silicon film and the back electrode to obtain a solar cell. The obtained solar cell by using the inventive method has low cost and high photoelectric transformation efficiency.

Description

technical field [0001] The invention relates to a method and a device for preparing polycrystalline silicon thin film solar cells. Background technique [0002] Polycrystalline silicon wafers and monocrystalline silicon wafers are currently the dominant materials for solar cells. Polycrystalline silicon is composed of silicon crystal grains and grain boundaries. The transport properties of carriers in silicon grains are similar to those in single crystal silicon. Carriers are only scattered more at the grain boundaries. . In polysilicon, the mobility of electrons can reach ~300cm 2 / Vs, the hole mobility can reach ~50cm 2 / Vs, which is much higher than that in amorphous silicon. For comparison between amorphous silicon and polycrystalline silicon, please refer to the attached figure 1 . In addition, the defects in polysilicon are mainly concentrated near the grain boundaries, and the probability of carriers being trapped only near the grain boundaries is high. Therefor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/20H01L21/268H01L31/18
CPCY02P70/50
Inventor 范振华
Owner 东莞晨真光伏有限公司
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