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Substrate processing apparatus

A substrate processing device and substrate technology, applied in thin material processing, transportation and packaging, conveyor objects, etc., can solve problems such as difficult to transport substrates stably, and achieve the effect of shortening time

Active Publication Date: 2009-04-01
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, even when the transfer speed of the transfer mechanism is only increased, there is a problem that it is difficult to transfer the substrate stably when the speed is increased too much.

Method used

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Embodiment Construction

[0026] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0027]

[0028] The configuration of a substrate processing apparatus according to an embodiment of the present invention will be described with reference to FIGS. 1 to 3 . FIG. 1 is a plan view of a substrate processing apparatus 1 . In addition, FIG. 2 is a side cross-sectional view of the substrate processing apparatus 1 viewed from the direction of arrow T1 in FIG. 1 . FIG. 3 is a side cross-sectional view of the substrate processing apparatus 1 viewed from the direction of arrow T2 in FIG. 1 . In addition, in FIGS. 1 to 3 , in order to clarify these directional relationships, an XYZ Cartesian coordinate system with the Z-axis direction as the vertical direction and the XY plane as the horizontal plane is added as needed.

[0029] The substrate processing apparatus 1 is a sheet-type apparatus that scrubs one set of a plurality of substrates (a batch) housed in a...

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Abstract

A substrate processing apparatus is capable of reducing the time for transporting substrates. An FOUP (Front-Opening Unified Pod) transport robot (20) transports an FOUP (80), which stores a plurality of substrates, between a loading port (10) and an FOUP placement stage (30). An indexer robot (40) transfers substrates (W) (unprocessed substrates) stored in the FOUP (80) placed on the FOUP placement stage (30), to a cleaning part (60) through a substrate transfer part (50); and receives and stores substrates (W) (processed substrates) subjected to scrub cleaning in the cleaning part (60), into the FOUP through the substrate transfer part (50). A plurality of FOUP placement stages (30) are provided around the indexer robot (40), so that the indexer robot (40) does not have to move in a horizontal direction at the time of transport, such that the time for transporting is reduced.

Description

technical field [0001] The present invention relates to a substrate processing apparatus for processing semiconductor substrates, glass substrates for liquid crystal display devices, glass substrates for photomasks, substrates for optical discs, etc. (hereinafter referred to as "substrates"). Background technique [0002] Products such as semiconductors and liquid crystal displays are manufactured through a series of processes such as cleaning, resist coating, exposure, development, etching, formation of interlayer insulating films, heat treatment, and dicing on the above-mentioned substrates. The substrate processing apparatus that performs the series of processes includes a processing unit that performs each process and a transfer robot that transfers the substrate to each processing unit. [0003] For example, a coating processing unit for coating a substrate with a resist, a developing processing unit for developing a substrate, and a transport robot for transporting a s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/677
CPCH01L21/67778H01L21/67766H01L21/67772Y10S414/137
Inventor 光吉一郎
Owner DAINIPPON SCREEN MTG CO LTD