Method of lithography patterning
A technology of graphics and lithography, applied in photography, photoengraving process of pattern surface, optics, etc., can solve the problems of inappropriateness and inconvenience of general process methods
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[0037] In order to further explain the technical means and effects that the present invention adopts to achieve the intended invention purpose, the specific implementation methods, steps, features and features of the lithography pattern forming method proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. Efficacy, detailed as follows.
[0038] The following description discloses many different embodiments, revealing some special combinations and arrangements. However, these embodiments are only examples, and thus do not limit the scope of the present invention. for example. The description of forming a first object on a second object may include embodiments in which the first and second objects are formed in direct contact, and may also include embodiments in which other objects are formed between the first and second objects, therefore The first and second objects are not in direct contac...
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