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Electrostatic chuck supply current sampling device, method and plasma device

A technology of electrostatic chuck and power supply current, which is applied in the field of plasma, can solve the problems of limited withstand voltage, poor reliability of current monitoring, high cost of high withstand voltage isolation amplifier, etc., and achieve the effect of low cost and high reliability

Active Publication Date: 2011-08-17
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The high cost of the isolation amplifier with high withstand voltage and the limited value of the withstand voltage lead to poor reliability of current monitoring

Method used

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  • Electrostatic chuck supply current sampling device, method and plasma device
  • Electrostatic chuck supply current sampling device, method and plasma device
  • Electrostatic chuck supply current sampling device, method and plasma device

Examples

Experimental program
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Embodiment Construction

[0018] Electrostatic chuck power supply current sampling device of the present invention, its preferred embodiment is as follows figure 2 As shown, a sampling resistor R3 is connected in series at the output end of the electrostatic chuck power supply, and the sampling resistor R3 can be connected in series with the positive electrode or the negative electrode of the output end of the electrostatic chuck power supply.

[0019] The two ends of the sampling resistor R3 are respectively connected with resistor dividers R1 and R2. One end of the resistor dividers R1 and R2 is connected to the endpoint of the sampling resistor R3, and the other end is grounded. The resistance divider points of the resistor dividers R1 and R2 are set to There are voltage acquisition devices, such as isolated operational amplifiers or other voltage acquisition devices.

[0020] The resistance point of the resistance divider R1, R2 is a tap in the middle of the resistance divider R1, R2, the resistan...

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PUM

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Abstract

The invention discloses an electrostatic chuck supply current sampling device, a method and a plasma device. The sampling device comprises a sampling resistance connected in series with the output end of an electrostatic chuck power supply, wherein both ends of the sampling resistance are connected with resistance dividers respectively; the other end of each resistance divider is earthed; and thedividing point of each resistance divider is provided with a voltage acquisition device. By measuring a voltage of each dividing point, a voltage between both ends of the sampling resistance is calculated so as to calculate the current in the sampling resistance, namely the output current of the electrostatic chuck power supply. The dividing points have lower voltage and lower requirements on thevoltage acquisition device, thereby ensuring low cost and high reliability of the entire device.

Description

technical field [0001] The invention relates to a plasma technology, in particular to an electrostatic chuck power supply current sampling device and method and a plasma device. Background technique [0002] Plasma etching technology is widely used in the manufacturing process of semiconductor devices. During the etching process, the substrate is placed on the electrostatic chuck, and is adsorbed on the surface of the chuck by the electrostatic attraction between the DC electrode of the chuck. The static electricity here is the DC high-voltage static electricity generated by the electrostatic chuck power supply. [0003] In the plasma etching process, in order to ensure the reliability of substrate adsorption, it is necessary to monitor the output current of the electrostatic chuck power supply, so as to monitor whether the electrostatic chuck power supply is working normally. Since the output voltage of the chuck power supply is usually a high voltage of several thousand ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/683G01R19/00G01R15/00
Inventor 蒲春
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD