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Steiner tree based approach for polygon fracturing

A polygonal, Steiner technique for mask data preparation that addresses low flexibility and portability

Active Publication Date: 2010-03-31
SYNOPSYS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

These changes to cut-line based methods are less flexible and less portable

Method used

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  • Steiner tree based approach for polygon fracturing
  • Steiner tree based approach for polygon fracturing
  • Steiner tree based approach for polygon fracturing

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Embodiment Construction

[0013] The detailed description hereinafter is given with reference to the accompanying drawings. Preferred embodiments will be described here in order to illustrate the present invention, but these preferred embodiments do not limit the scope of the present invention, which is defined by the claims. Those skilled in the art will recognize various equivalent modifications to the ensuing description.

[0014] Overview of Polygon Fracture Methods

[0015] The innovative approach described here for solving the polygon partitioning problem is based on the formalization of a variant of Steiner's minimum tree, referred to hereafter as a minimum partitioning tree (MPT). The inflection vertices of the original polygon and some additional points intersected by the candidate cutting lines and the polygon boundaries are used as end nodes of the tree. A split is obtained by constructing a specific formalized Steiner tree on these tree endpoints, whose cutting lines are suggested by th...

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Abstract

Roughly described, a method for mask data preparation is described, for use with a preliminary mask layout that includes a starting polygon, the vertices of the starting polygon including I-points (vertices of the starting polygon having an interior angle greater than 90 degrees), including steps of developing a rectilinear partition tree on at least the I-points of the starting polygon, and usingthe edges of the partition tree to define the partition of the starting polygon into sub-polygons for mask writing.

Description

technical field [0001] The present invention relates to mask data preparation for integrated circuit fabrication, and more particularly to an innovative tree-based method for breaking layout polygons into sub-polygons (irregular polygons are more useful) for mask writing. Background technique [0002] As device processes continue to scale below the 65nm process node, the number of geometries increased by the proliferation of resolution-enhanced technology (RET) continues to grow. Part of the reason is that 193nm lithography has to take advantage of each new process node to meet tight geometries. As a result, issues such as complexity, runtime, and quality associated with mask data preparation (MDP) are growing dramatically. As a main and core step in MDP, polygon breaking (segmentation) converts complex polygons generated by the layout process into non-overlapping trapezoids suitable for mask writing. The runtime and quality of segmentation directly affects the cost, integ...

Claims

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Application Information

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IPC IPC(8): G06F17/50
CPCG03F1/14G03F1/68
Inventor 苏清卢洋奎查尔斯·C·江
Owner SYNOPSYS INC
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