Substrate heating apparatus

A technology for heating devices and substrates, which is applied in the fields of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., and can solve problems such as solar cell efficiency degradation

Inactive Publication Date: 2010-03-31
JUSUNG ENG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This thermal stress leads to problems degrading the efficiency of solar cells made by subsequent processing

Method used

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Examples

Experimental program
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Embodiment Construction

[0025] figure 2 is a cross-sectional view of a substrate heating apparatus according to an embodiment of the present invention.

[0026] Figures 3 to 5 is a modified cross-sectional view of the substrate heating apparatus according to the embodiment of the present invention.

[0027] refer to figure 2 , The substrate heating apparatus according to the embodiment of the present invention includes: a chamber 100 ; a substrate supporting unit 200 supporting the substrate 10 ; and a heating unit 300 disposed under the substrate 10 . The heating unit 300 includes: a plurality of reflecting units 310 ; a plurality of lamp heating units 320 , each of which is disposed inside the plurality of reflecting units 310 ; and a short-wavelength blocking layer 330 disposed above the lamp heating units 320 .

[0028] The chamber 100 includes a hollow chamber body 110 and a chamber cover 120 covering the chamber body 110 . The chamber body 110 is formed in a cylindrical shape with an ope...

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Abstract

A substrate heating apparatus is provided. The substrate heating apparatus includes a chamber, a substrate supporting unit configured to support at least one substrate where a thin film is formed on the top surface thereof, and at least one heating unit disposed in a region adjacent to the rear surface of the substrate. The heating unit includes a plurality of reflecting units arranged under the substrate, at least one lamp heating unit disposed inside the plurality of reflecting units, and a short- wavelength blocking layer disposed on the lamp heating unit. By providing the lamp heating unitunder the substrate where the thin film or pattern is formed on the top surface, and supplying heat energy to the rear surface of the substrate, it is possible to prevent the degradation in efficiency of the thin film, such as degradation of the thin film formed on the top surface of the substrate due to the heat source or the peeling of the thin film due to the temperature deviation between thesubstrate and the thin film. Furthermore, the heat energy is widely spread out at the central region of the rear surface of the substrate, and the heat energy is focused at the edge region of the substrate, thereby heating the large-sized substrate uniformly.

Description

technical field [0001] The present invention relates to a substrate heating device, and more particularly to a substrate heating device for preheating a large substrate that has been surface treated or that a thin film is deposited thereon. Background technique [0002] Generally, since a large substrate has a slow rate of temperature increase, it is heated to a processing temperature in a preheating chamber (ie, a substrate heating device) before main processing. That is, in the case where an unheated substrate is loaded into the chamber for main processing, additional processing time for heating the substrate is required. In addition, if a low-temperature substrate is loaded into a high-temperature main chamber, the substrate may be thermally damaged and the internal temperature of the main chamber decreases. [0003] Therefore, according to the related art, providing figure 1 The substrate heating apparatus illustrated in is used to preheat the substrate. [0004] refe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/324
CPCH01L21/67115
Inventor 朴愿硕金起德李龙炫崔承大
Owner JUSUNG ENG
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