Automatic large-scale flat-type pecvd crystalline silicon photovoltaic anti-reflection coating preparation equipment

Abstract

The invention relates to a thin film preparation device, in particular to a fully automatic large-scale flat PECVD crystalline silicon photovoltaic anti-reflection coating equipment with a single chamber working under vacuum conditions, which solves the single problem of the PECVD equipment with a tubular structure in the prior art. The production time is too long, the output is low, and the multi-chamber flat PECVD equipment needs to work under vacuum conditions. The equipment is mainly equipped with a loading platform, a preheating platform, a PECVD chamber, a cooling platform, an unloading platform and a vacuum pumping system. The platform and the cooling platform are respectively connected to the protective gas pipeline, and the PECVD chamber is connected to the vacuum pumping system through the pipeline. The invention only provides a vacuum environment for the PECVD chamber, and the rest work under the atmosphere or protective gas. The present invention can also achieve the technical index of tube type PECVD and multi-chamber plate type PECVD under the condition that only a single chamber works under vacuum condition.

Description

Technical field [0001] The invention relates to a thin film preparation device, in particular to a fully automatic large-scale flat plate PECVD (Plasma Enhanced Chemical Vapor Deposition) crystalline silicon photovoltaic anti-reflection coating equipment with a single chamber working under vacuum conditions. Background technique [0002] At present, the plasma-enhanced chemical vapor deposition method (ie, PECVD method) is mainly used to prepare an anti-reflection film on the surface of photovoltaic silicon. Because the plasma-enhanced chemical vapor deposition method (PECVD) is the most mature technology and relatively simple operation among several methods for preparing thin film materials, and it can prepare large-area thin films with high uniformity. At this stage, there are two types of equipment used in the photovoltaic field to prepare anti-reflection films. One is PECVD equipment with a tubular structure. The single production time of this structure is too long, resu...

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Problems solved by technology

[0003] The purpose of the present invention is to provide a fully automatic large-scale flat PECVD crystalline silicon photovoltaic anti-reflection coating equipment with a single chamber working under vacuum conditions, so as to solve the problem of excessive single production time in the PECVD equipment with tubular structure in the prior art. The problems of long length and low output, and the need to work under vacuum conditions in multi-chamber flat PECVD equipment

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