Multi-color light adjustment mask, its manufacture method and a pattern transfer-printing method

A manufacturing method and photomask technology, which is applied in the field of multi-color photomasks, can solve problems such as difficulty in producing grayscale masks, and achieve the effects of suppressing poor operation and suppressing the decrease in transmittance

Active Publication Date: 2010-07-28
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, the wavelength characteristics of the light source of the exposure machine change with the passage of time, so if the light transmission characteristics of the semi-transparent film and the correction film are designed without considering the wavelength characteristics of the exposure light during actual exposure, it is difficult to produce high-precision gradation. mask

Method used

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  • Multi-color light adjustment mask, its manufacture method and a pattern transfer-printing method
  • Multi-color light adjustment mask, its manufacture method and a pattern transfer-printing method
  • Multi-color light adjustment mask, its manufacture method and a pattern transfer-printing method

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Embodiment Construction

[0054] Hereinafter, several embodiments of the present invention will be described with reference to the drawings.

[0055] figure 1 It is a cross-sectional view for explaining a pattern transfer method using a multi-color photomask. figure 1 The shown multi-color photomask 10 is used, for example, to manufacture electronic devices such as thin-film transistors (TFTs) of liquid crystal display devices (LCDs). figure 1 Two or more resist patterns 23 having different film thicknesses stepwise or continuously are formed on the transfer target body 20 shown. also, figure 1 Reference numerals 22A and 22B denote films laminated on the substrate 21 in the body to be transferred 20 .

[0056] An example of a three-tone mask in which the above-mentioned multi-color light mask 10 has a semi-transparent portion in addition to the light-shielding portion and the light-transmitting portion is shown. Specifically, the multi-color light mask 10 is configured to have: part 11, which block...

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Abstract

The invention provides a multi-color light adjustment mask, its manufacture method and a pattern transfer-printing method. The multi-color light adjustment mask with more than two resist patterns of different resist residual-film values and a transfer-printing pattern with a light shading part, a light transmitting part and a semi light transmitting part are formed on a body to be transfer-printed. The light shading part is formed by forming a light shading film on a transparent substrate. The light transmitting part is formed by exposing the transparent substrate. The semi light transmitting part comprises a normal part composed of a semi light transmitting film formed on the transparent substrate and a correction part formed by a correction film formed on the transparent substrate. The phase difference between the light transmitting part and the correction part is below 80degree direct towards i-g line wavelength light.

Description

technical field [0001] The present invention relates to a multi-color photomask used in the manufacture of liquid crystal display (Liquid Crystal Display: hereinafter referred to as LCD), etc., a multi-color photomask manufacturing method, and a pattern transfer method, and particularly relates to A multi-color photomask for manufacturing a thin film transistor used in the manufacture of a device, a multi-color photomask manufacturing method, and a pattern transfer method. Background technique [0002] In the LCD field, thin film transistor liquid crystal display (Thin Film Transistor Liquid Crystal Display: hereinafter referred to as TFT-LCD) has the advantages of easy thinning and low power consumption compared with CRT (cathode ray tube), so fast towards commercialization. TFT-LCD has a general structure as follows: a TFT substrate with a structure in which TFTs are arranged on each pixel arranged in a matrix, and color filters with red, green, and blue pixel patterns ar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F1/08G03F1/28G03F1/68
CPCG03F1/36G03F1/54G03F1/76H01L21/0332H01L21/0337
Inventor 坂本有司
Owner HOYA CORP
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