Cosmetic capable of eliminating striae gravidarum and scars
A technology for cosmetics and stretch marks, applied in the field of preparations that can eliminate stretch marks and scars, can solve problems such as unsatisfactory effects of stretch marks and scar repair, unsuitable for stretch mark treatment, difficulty in mastering the depth, etc., and achieves enhancement of skin physiological function, Enhances skin regeneration and accelerates wound healing
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0022] Example 1: Weigh 20g of 1,3-butanediol, 20g of nicotinamide, 1g of allantoin, 2g of methyl ester, 10g of epidermal growth factor, VB 2 10g, asiaticoside 10g, cocoa butter 25g, collagen 30g, deionized water 50g.
[0023] After taking the material according to the above formula, heat the deionized water to 85-95°C and keep it warm for 15-20 minutes, then add glycerin, 1,3-butanediol and allantoin after sterilization, stir and dissolve completely, then cool down to 45°C ~50°C, then add epidermal growth factor, cocoa butter, collagen, VB in sequence 2 , asiaticoside and methyl ester preservatives, stir and dissolve completely.
[0024] Among them, 1,3-butanediol used in the present invention is produced by Guangzhou Taiqi Chemical Technology Co., Ltd.; nicotinamide is produced by Zhejiang Lanbo Biotechnology Co., Ltd.; allantoin is produced by Shandong Qingzhou Ailitong Chemical Technology Co., Ltd.; epidermal cell growth Factor (EGF) was produced by Zhuhai Grace Cosmetic...
PUM
Property | Measurement | Unit |
---|---|---|
molecular weight | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com