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Processing liquid supply system and processing liquid supply method

A technology for supplying system and treatment liquid, applied in the direction of surface coating liquid device, electrical components, photoengraving process coating equipment, etc., can solve the problem of shortening the replenishment time, increasing the opportunity of replenishing the treatment liquid, unable to disappear the treatment liquid, etc. problems, to achieve the effect of extending the production takt time and preventing the production takt time

Inactive Publication Date: 2010-08-18
TOKYO ELECTRON LTD
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Problems solved by technology

[0017] In view of the above problems, there is also a method of shortening each supplementary time by detecting the remaining amount of treatment liquid in the L / E tank 50 in multiple stages and increasing the chance of supplementing the treatment liquid. The state of supplying the treatment liquid disappears completely

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  • Processing liquid supply system and processing liquid supply method
  • Processing liquid supply system and processing liquid supply method

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Embodiment Construction

[0034] Embodiments of the present invention will be described below with reference to the accompanying drawings. figure 1 It is a flow diagram schematically showing the configuration of the treatment liquid supply system of the present invention.

[0035] The illustrated processing liquid supply system 100 is a system for supplying a processing liquid used in, for example, a photolithography process as an upper stage process.

[0036] As shown in the figure, the treatment liquid supply system 100 includes: L / E (liquid terminal) tank 1 (treatment liquid storage tank), which is used to store the treatment liquid L to supply the treatment liquid L to the upper stage process (upper stage device) ; A buffer tank 2 (processing liquid replenishment means) for replenishing the processing liquid L in the L / E tank 1 .

[0037] In addition, it is preferable that the volume of the buffer tank 2 is sufficiently larger (for example, 10 liters) than the L / E tank 1 having a predetermined vo...

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Abstract

The invention provides a processing liquid supply system and processing liquid supply method. The processing liquid supply system for supplying the processing liquid stored in a tank for a device using the specified processing liquid can supply the processing liquid for the device and adding the processing liquid into the tank simultaneously, thus the production beat time is prevented to be prolonged. The processing liquid supply system comprises a processing liquid storage tank for outputting the processing liquid, a processing liquid adding part for supplying the processing liquid for the processing liquid storage tank into the processing liquid storage tank by an adding pipeline, a valve for opening and closing the adding pipeline, a first pressure adjusting part for adjusting the pressure in the processing liquid storage tank into a first pressure value, and a second pressure adjusting part for adjusting the pressure nearer the processing liquid adding part side than the valve into a second pressure value higher than the first pressure value, after the valve is opened, the processing liquid is supplied for the device from the processing liquid storage tank, and the processing liquid is supplied for the processing liquid storage tank from the rocessing liquid adding part.

Description

technical field [0001] The present invention relates to a processing liquid supply system and a processing liquid supply method for supplying, for example, a processing liquid such as a resist or a solvent used in a photolithography process. Background technique [0002] For example, in the manufacture of FPDs, a circuit pattern is formed by a so-called photolithography process. The photolithography process is as follows: After forming a predetermined film on a substrate to be processed such as a glass substrate, a photoresist (hereinafter referred to as a photoresist) is applied. resist) to form a resist film, expose the resist film corresponding to the flow channel pattern, and perform a development process on the resist film. [0003] In the photolithography process described above, a system for supplying a resist and a supply system for supplying a processing liquid such as a solvent for dissolving the resist are required. Therefore, as shown in Patent Document 1, there...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16
CPCB05C11/1002G03F7/16H01L21/67017H01L21/6715
Inventor 植田稔彦
Owner TOKYO ELECTRON LTD
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