Bonding wire for semiconductor devices
一种接合线、半导体的技术,应用在半导体器件、半导体/固态器件制造、焊接介质等方向,能够解决接合强度降低、线表面腐蚀、没有实用化等问题,达到提高直线性、降低损伤、促进稳定化的效果
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[0098] Examples are described below.
[0099] As the raw material of the bonding wire, Cu, Au, and Ag used for the core material are high-purity materials with a purity of about 99.99% by mass or more, and Au, Pt, Pd, Ru, and Rh used for the skin layer or the middle metal layer Materials Raw materials with a purity of 99.9% by mass or higher were prepared.
[0100] A wire thinner than a certain wire diameter is used as a core material, and electrolytic plating, electroless plating, vapor deposition, melting, etc. are performed to form layers of different metals on the surface of the wire, and heat treatment is performed. The following methods are used: a method of forming the skin layer according to the final wire diameter, and a method of forming the skin layer at a certain wire diameter and then thinning it to the final wire diameter by wire drawing. As the electrolytic plating solution and the electroless plating solution, commercially available plating solutions for...
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