Linear multi-wavelength confocal microscope module and confocal microscopic method and system thereof

Abstract

The invention provides a linear multi-wavelength confocal microscopic system, which uses more than two chromatic lenses to enable a linear incident light field to generate dispersed rays and to enable rays with different wavelengths to be focused at different positions. Moreover, the invention utilizes a linear multi-wavelength confocal microscope module with a linear scanning confocal principle and a light source dispersion technique to develop a long-field-depth high-definition optical micro-morphological profile microscopic method and a system by using a confocal microscopic technique withoptical sectioning capacity and in combination with the high definition of spectral dispersion. The method and the system of the invention use a broadband light source. By adopting a dispersion objective module, the broadband light source is enabled to generate axially dispersed rays which are focused at different depths, the focused surface reflectance spectrum is obtained simultaneously, spatial filtering is conducted through a slit, the peak position of a spectral focusing response curve is accurately sensed by a linear spectral image sensing unit and thereby sectional profile measurement can be finished accurately and rapidly.

Description

Technical field [0001] The present invention relates to an optical three-dimensional topography measurement technology, in particular to a method and system that combines the linear confocal principle and broadband light source dispersion technology to develop a long depth of field and high resolution dispersion objective lens module and a multi-wavelength confocal microscopy method and system. Background technique [0002] In the field of precision microstructure processes, such as the IC industry, semiconductor industry, LCD industry, electromechanical automation industry, photoelectric measurement industry, etc., the three-dimensional topography measurement procedure is an important procedure to ensure uniform process quality. In detection technology, because optical or photoelectric combination methods have the characteristics of high accuracy and non-contact, optical methods are currently commonly used to detect the tiny outline, thickness or size of objects. At present...

AI Technical Summary

Problems solved by technology

[0009] The invention provides a linear multi-wavelength confocal microscope module, which can disperse the linear light field on the one hand and focus the reflected linear light field on the same plane by the combination of a plurality of chromatic aberration lenses. The problem of field curvature aberration to simplify the problem of the complexity of common linear dispersion systems

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