Cover plate on coating process chamber

A process chamber and cover plate technology, which is applied in metal material coating process, sputter plating, ion implantation plating, etc., can solve the problems of non-interchangeable installation, lack of interchangeability of cover plates, and increased production costs. To achieve the effect of increasing interchangeability

Inactive Publication Date: 2011-01-12
黄峰
2 Cites 0 Cited by

AI-Extracted Technical Summary

Problems solved by technology

The disadvantage of the cover plates on the coating process chamber currently used is that the structure of each cover plate can only be matched with the functional parts installed on it, that is: the vacuum pump cover plate only has a vacuum pump installation hole, and only the vacuum pump can be installed; the cathode cover plate There are only target mounting holes on the surface, and only the corresponding cath...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Abstract

The invention discloses a cover plate on a coating process chamber, which can exchange a vacuum pump with a cathode target according to the production demands. The cover plate comprises a plate body, wherein the middle part of the plate body is provided with a plurality of vacuum pump mounting holes which cooperate with the vacuum pump; and both ends of the plate body are respectively provided with a target mounting hole which cooperates with the target. The invention is used for the coating process chamber for producing evaporation coating glass.

Application Domain

Technology Topic

Image

  • Cover plate on coating process chamber
  • Cover plate on coating process chamber
  • Cover plate on coating process chamber

Examples

  • Experimental program(1)

Example Embodiment

[0014] The cover plate on the coating process chamber of the present invention will be described in further detail below with reference to the drawings and specific embodiments.
[0015] Such as figure 1 As shown, the cover plate on the coating process chamber of the present invention includes a plate body 1. The middle of the plate body 1 is provided with a number of vacuum pump mounting holes 2 matched with vacuum pumps. The number of vacuum pump mounting holes 2 can be adjusted according to production needs. It is set that both ends of the plate body 1 are respectively provided with a target mounting hole 3 matched with the target.
[0016] The working principle of the present invention is as follows: Taking the cover plate of the coating process chamber with three vacuum pump mounting holes as an example, the working principle will be described in detail. Such as figure 2 As shown, when it is used as a vacuum pump cover, only the vacuum pump 5 and the vacuum pump mounting hole 2 need to be installed together, and the target mounting hole 3 is sealed with the target sealing plate 7. If two vacuum pumps are installed, the extra one The vacuum pump mounting hole is sealed with a vacuum pump sealing plate 4, and so on. Such as image 3 As shown, when it is used as a single-plane target cover plate, only the single-plane target needs to be installed in cooperation with the target mounting hole 3 through the single-plane target mounting plate 6, and the vacuum pump mounting hole 2 is sealed with the vacuum pump sealing plate 4. Such as Figure 4 As shown, when it is used as a double-plane target cover plate, only the double-plane target needs to be installed in cooperation with the target mounting hole 3 through the double-plane target mounting plate 8, and the vacuum pump mounting hole 2 is sealed with the vacuum pump sealing plate 4. Such as Figure 5 As shown, when it is used as a rotating target cover plate, only the rotating target needs to be installed in cooperation with the target mounting hole 3 through the rotating target mounting plate 9, and the vacuum pump mounting hole 2 is sealed with a vacuum pump sealing plate 4. Such as Image 6 As shown, when it is used as a dual-rotating target cover plate, only the dual-rotating target needs to be installed in cooperation with the target mounting hole 3 through the dual-rotating target mounting plate 10, and the vacuum pump mounting hole 2 is sealed with a vacuum pump sealing plate 4. If the production process requires that the vacuum pump 5 and the cathode target material be installed on the same cover plate at the same time, this cover plate can also meet the above requirements, only the vacuum pump and the cathode cover plate need to be connected to the vacuum pump mounting hole 2 and target mounting hole 3 respectively. Just install it together, and seal the remaining vacuum pump mounting holes with vacuum pump sealing plates. In this way, the production of the cover plate can be standardized, so that the cover plate can be used interchangeably, and the production cost can be reduced, and it can meet the needs of upgrading the coating process chamber without causing waste of the cover plate.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

no PUM

Description & Claims & Application Information

We can also present the details of the Description, Claims and Application information to help users get a comprehensive understanding of the technical details of the patent, such as background art, summary of invention, brief description of drawings, description of embodiments, and other original content. On the other hand, users can also determine the specific scope of protection of the technology through the list of claims; as well as understand the changes in the life cycle of the technology with the presentation of the patent timeline. Login to view more.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Similar technology patents

Optical record control system

InactiveCN1737913AImprove hardware efficiencyImprove interchangeabilityInformation arrangementOptical record carriersChannel dataData error
Owner:LEJIN GUANGDIAN ELECTRONIC CO LTD SHANGHAI

Classification and recommendation of technical efficacy words

Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products