Cover plate on coating process chamber

A process chamber and cover plate technology, which is applied in metal material coating process, sputter plating, ion implantation plating, etc., can solve the problems of non-interchangeable installation, lack of interchangeability of cover plates, and increased production costs. To achieve the effect of increasing interchangeability

Inactive Publication Date: 2011-01-12
黄峰
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  • Summary
  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

The disadvantage of the cover plates on the coating process chamber currently used is that the structure of each cover plate can only be matched with the functional parts installed on it, that is: the vacuum pump cover plate only has a vacuum pump installation hole, and only the vacuum pump can be installed; the cathode cover plate There are only target mounting holes on the surface, and only the corresponding cath

Method used

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  • Cover plate on coating process chamber
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  • Cover plate on coating process chamber

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[0014] The cover plate on the coating process chamber of the present invention will be described in further detail below with reference to the drawings and specific embodiments.

[0015] Such as figure 1 As shown, the cover plate on the coating process chamber of the present invention includes a plate body 1. The middle of the plate body 1 is provided with a number of vacuum pump mounting holes 2 matched with vacuum pumps. The number of vacuum pump mounting holes 2 can be adjusted according to production needs. It is set that both ends of the plate body 1 are respectively provided with a target mounting hole 3 matched with the target.

[0016] The working principle of the present invention is as follows: Taking the cover plate of the coating process chamber with three vacuum pump mounting holes as an example, the working principle will be described in detail. Such as figure 2 As shown, when it is used as a vacuum pump cover, only the vacuum pump 5 and the vacuum pump mounting hole...

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Abstract

The invention discloses a cover plate on a coating process chamber, which can exchange a vacuum pump with a cathode target according to the production demands. The cover plate comprises a plate body, wherein the middle part of the plate body is provided with a plurality of vacuum pump mounting holes which cooperate with the vacuum pump; and both ends of the plate body are respectively provided with a target mounting hole which cooperates with the target. The invention is used for the coating process chamber for producing evaporation coating glass.

Description

technical field [0001] The invention relates to a cover plate on a coating process chamber for producing coated glass. Background technique [0002] The coating process room is the main process room in the vacuum coated glass production line. According to the process requirements, the coating process room is usually divided into several chambers, each chamber is equipped with a cover plate, and each cover plate is distinguished according to the different functional components installed on the cover plate, which can be roughly divided into vacuum pump cover plate And the cathode cover plate, the cathode cover plate also includes: single plane target cover plate, double plane target cover plate, rotating target cover plate, double rotating target cover plate, etc. The disadvantage of the cover plates on the coating process chamber currently used is that the structure of each cover plate can only be matched with the functional parts installed on it, that is: the vacuum pump co...

Claims

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Application Information

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IPC IPC(8): C23C14/22
Inventor 黄峰
Owner 黄峰
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