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Dynamic control method for radon concentration of multiple radon chambers with one source

A technology of dynamic control and radon concentration, applied in the direction of various fluid ratio control, etc., can solve problems such as process level leakage

Inactive Publication Date: 2011-11-16
EAST CHINA UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the natural attenuation of radon and the leakage caused by the technological level of the radon room exist objectively. It is impossible to achieve the absolute stability of the radon concentration in the radon room. It can only be required to be stable within a certain error range, that is, dynamic stability.

Method used

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  • Dynamic control method for radon concentration of multiple radon chambers with one source
  • Dynamic control method for radon concentration of multiple radon chambers with one source
  • Dynamic control method for radon concentration of multiple radon chambers with one source

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Embodiment 1

[0040] The present invention will be described in more detail through the accompanying drawings and specific embodiments below.

[0041] The specific operation steps are as follows:

[0042] a. Initialize, set , ;

[0043] b. Calculate the current concentration of the main radon chamber according to formula (3) ;

[0044] c. Compare the current radon concentration with the minimum target radon concentration, if and , indicating that the current concentration is lower than the predetermined concentration, and it is not in the state of radon supplementation. Send fill radon command concatenate ; At this time, if then set ;

[0045] d. Compare the current radon concentration with the maximum target radon concentration, if and , indicating that the current radon concentration in the main radon room has reached the predetermined maximum concentration and is in the state of radon supplementation, then a command to stop radon supplementation will be sent to disc...

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Abstract

The invention relates to a control method for the concentration of radioactive gas, in particular to a control method for the radon concentration in multiple radon chambers with one source, which is characterized in that a variable and a control error are taken as a factor for deciding whether radon is supplemented in each radon chamber or not to guarantee that the radon activity in the radon chambers is maintained in the required range after setting the activity value of the radon in the radon chambers and the allowable error and measuring the background activity value in the radon chambers;the supplement of the radon in the radon chambers is guaranteed not to be influenced by the fluctuation of the radioactivity statistics of the radon; the radon activity in the radon chambers is accurately maintained, i.e. the stability of the radon concentration; and the frequent switching of a radon source control valve because of the fluctuation of the radioactivity statistics of the radon is prevented so that the service life of the radon source control valve can be effectively enhanced. Because the integral operation course utilizes the practice as a control factor, the method of the invention has the advantages of easy realization of automation operation and further enhancement of control accuracy.

Description

technical field [0001] The invention relates to a method for controlling the concentration of radioactive gas, in particular to a method for dynamically controlling the radon concentration in a one-source multi-body radon chamber according to the law of radon decay and leakage. Background technique [0002] The radon chamber is a standard device for calibrating radon measuring instruments in the field of radiation measurement, which requires it to meet certain performance indicators, so that it can achieve a certain expectation within a period of time (tens of hours to hundreds of hours) concentration and keep it constant. However, the natural attenuation of radon and the leakage caused by the technological level of the radon room exist objectively. It is impossible to achieve the absolute stability of the radon concentration in the radon room. It can only be required to be stable within a certain error range, that is, dynamic stability. . [0003] The one-source multi-bod...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05D11/02
Inventor 周书民汤彬王仁波陈锐
Owner EAST CHINA UNIV OF TECH
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