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Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix

A technology of photosensitive resin and composition, which is applied in different fields to improve the formation of fine patterns, and can solve the problems of over-erosion of the developer, hindering the photocrosslinking of photosensitive black pigments, and lowering the sensitivity, so as to improve the optical density difference, Excellent storage stability, the effect of reducing thermal fluidity

Active Publication Date: 2013-03-27
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, for the photosensitive resin composition used to prepare the resin black matrix, effective photocrosslinking cannot be caused due to the black pigment that seriously hinders the photosensitivity, and a phenomenon caused by the developer called "undercut phenomenon (undercut)" occurs. The problems caused by over erosion, insufficient development stability and lower sensitivity
Korean Patent Application No. 1995-0702313 discloses the use of a cationic ring (Cardo) resin in a photosensitive resin composition for a black matrix in order to improve sensitivity, but it has the following problem: that is, the resin has a bulky molecular structure that makes it sticky. Reduced adhesion, especially in the case of black matrices, in order to achieve the required optical density, the content of black pigment is higher, so the adhesion is very low
Korean Patent Application No. 2000-0055255 discloses a cationic ring resin and a silane coupling agent obtained by copolymerizing various monomers, but its storage stability is poor, and when a fine pattern is formed by thermal fluidity during the post-baking process There is a problem of optical density difference at different positions

Method used

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  • Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix
  • Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix
  • Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix

Examples

Experimental program
Comparison scheme
Effect test

preparation example

[0093] Preparation of Pigment Dispersion Liquid M

[0094] 20.0g of carbon black, 6g of AJISPER PB821 (produced by Ajinomoto Fine Chemicals Co., Ltd.) as a dispersant, and 74g of propylene glycol monomethyl ether acetate as a solvent were mixed and dispersed in a bead mill for 12 hours to prepare Pigment dispersion M.

Synthetic example 1～20

[0095] Synthesis of Alkali-Soluble Resin

[0096] In a 1000mL flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen conduit, add propylene glycol monomethyl ether in the following Table 2 and Table 3 (the unit of the following Tables 2 and 3 is g). Acetate (PGMA), AIBN, 2-Acryloyloxyethylsuccinate (B-1), N-Phenylmaleimide, Styrene, Methacrylic Acid, Isobornyl Methacrylate Type (B-2), nitrogen gas (replacing air with nitrogen gas, the unit in Table 2 and Table 3 below is g). Then, the temperature of the reaction liquid was raised to 100° C. while stirring, and then reacted for 7 hours. The final solid content of the alkali-soluble resin thus synthesized, the acid value of the solid content, and the weight-average molecular weight measured by GPC are shown in Tables 2 and 3. (B-1) and (B-2) used in each synthesis example are the same as in Table 1 below.

[0097] Table 1

[0098]

[0099]

[0100] Table 2

[0101]

...

Embodiment 1～17

[0104] Preparation of black photosensitive resin composition

[0105] A black photosensitive resin composition was prepared with the compositions in Tables 4 and 5 below by a method known in the art. The unit of the following Tables 4 and 5 is g.

[0106] Table 4

[0107]

[0108] table 5

[0109]

[0110] 1) KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.)

[0111] 2) Ciba Specialty Chemicals

[0112] 3) Ciba Specialty Chemicals

[0113] 4) Ciba Specialty Chemicals

[0114] 5) 4,4'-bis(N,N'-dimethylamino)-benzophenone (manufactured by Hodogaya Chemical Industry Co., Ltd.)

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Abstract

The invention provide a black photosensitive resin composition, which comprises contains an alkali-developable resin (B) obtained by polymerizing a monomer including compounds marked with chemical formula 1. A black matrix (Black Matrix) manufactured by the black photosensitive resin and a color filter (Color Filter) including the black matrix are also provided. The black photosensitive resin composition is good in adhesion performance to substrates and storage stability. The bake processing thermal fluidity is reduced while the sensitivity thereof is maintained, so that the optical density difference between different positions during the formation of fine patterns is improved.

Description

technical field [0001] The present invention relates to a kind of black photosensitive resin composition, the black matrix (Black Matrix) that makes with it and the color filter (Color Filter) that has this black matrix (Color Filter), specifically, the present invention relates to a kind of substrate A black photosensitive resin composition with excellent adhesion and storage stability, which can reduce thermal fluidity during post-baking treatment while maintaining sensitivity, thereby improving the optical density difference at different positions when forming fine patterns; the present invention also provides It relates to a black matrix prepared by using the black photosensitive resin composition and a color filter with the black matrix. Background technique [0002] In the color filter of the liquid crystal display, the black matrix is ​​used to block the uncontrolled light penetrating through the small transparent electrodes and improve the contrast. It can be made of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004G02B5/20G02F1/1335
CPCG02B5/20G02B5/201G03F7/004G03F7/0045G03F7/027
Inventor 金周成申奎澈陆成薰
Owner DONGWOO FINE CHEM CO LTD
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