CMOS image sensor pixel unit with high filling factor and pixel array work method thereof
An image sensor and pixel unit technology, applied in image communication, TV system parts, electrical components, etc., can solve the problems of sensitivity, signal-to-noise ratio fill factor degradation, etc., to achieve convenient control, improve fill factor, and simple structure Effect
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[0036] This embodiment adopts the AMIS (On Semiconductor) CMOS technology and rules of 0.35um thickness size, so that each pixel unit only needs the 1T-APS test structure of one polysilicon layer and five metal layers, and each pixel unit plane size is 7um×7um.
[0037] The chip of this embodiment specifically adopts the simplest 1T-APS pixel array of 2×2 pixel units, and its equivalent circuit is as follows figure 2 As shown, the corresponding layout is as Figure 4 shown.
[0038] The circuit structure of each pixel unit of the pixel array chip, the equivalent circuit is as figure 1 As shown, wherein: N1 is a diode with a P+ / N-Well / P-sub structure, and its P+ terminal is electrically connected to the control signal; M1 is a source follower transistor, and its base is electrically connected to the P+ / N-Well / P - a sub diode, the emitter is electrically connected to the bias current through the column readout bus, and the collector is electrically connected to the bias volt...
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