Alignment adjusting device and alignment adjusting method
An adjustment device and pre-alignment technology, which is applied in the direction of optics, instruments, and photoplate-making processes on patterned surfaces, and can solve problems such as lack of alignment references
Active Publication Date: 2014-02-19
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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[0008] The purpose of the present invention is to provide an alignment adjustment device and an alignment adjustment method to solve the problem of no alignment reference when the mask pre-alignment system is integrated into a photolithography machine
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[0052] The alignment adjustment device and alignment adjustment method proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in very simplified form and use imprecise ratios, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.
[0053] The core idea of the present invention is to provide an alignment adjustment device, which includes an analog reticle, a positioning and alignment mechanism, and a parallelogram prism mechanism, the analog reticle has an alignment mark, and the alignment mark is the The installation of the mask pre-alignment sensor provides an alignment reference; the positioning alignment mechanism and the parallelogram prism mechanism adjus...
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The invention discloses an alignment adjusting device. The device comprises a simulation mask, a positioning aligning mechanism and a parallelogram prism mechanism, wherein, the simulation mask is provided with an aligning mark which provides aligning reference for installation of a mask prealigning sensor and the positioning aligning mechanism and the parallelogram prism mechanism adjust X-oriented and Y-oriented positions of the aligning mark relative to a reference axis at the top of a projection lens; precision of the positioning aligning mechanism at RZ direction and measurement accuracy of each position are adjusted so as to allow positional precision after adjustment to meet precision requirements of integration of a mask aligner. Meanwhile, the invention also provides an alignment adjusting method. According to the method, position relationship between the aligning mark and a support plate is adjusted at first, range measurement accuracy between the aligning mark and a support plate is also adjusted; then position relationship between the support plate and the reference axis at the top of the projection lens is adjusted; finally, precision of the positioning aligning mechanism at RZ direction is adjusted. The method is simple and reliable.
Description
technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to an alignment adjustment device and an alignment adjustment method for a mask pre-alignment sensor. Background technique [0002] At present, in the field of micro-manufacturing, many parts on equipment need to be assembled by using special tooling. For example, in the whole machine integration process of the lithography machine, the installation and testing of many parts and components need to use high-precision special adjustment tooling to achieve and meet the integration precision requirements of the product. [0003] As semiconductor devices and integrated circuits put forward higher and higher requirements for lithography exposure technology, the technology in lithography method and alignment accuracy is also updated day by day. In photolithography of silicon wafers, due to the high requirements for overlay accuracy, diffraction gratings are generally used t...
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IPC IPC(8): G03F9/00
Inventor 施胜男
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD