Array substrate, preparation method thereof and electric paper display

An array substrate and manufacturing method technology, applied in the field of active display, can solve the problems of poor feasibility and high requirements, and achieve the effects of reducing influence, simplifying manufacturing process, and saving manufacturing cost

Active Publication Date: 2014-11-05
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this technical solution must use a special black organic photosensitive material as the light-shielding layer, and in the manufacturing process, the requirements for the manufacturing process are relatively high. For example, it is required to ensure that the black organic photosensitive material has a certain flatness and hardness. Moreover, it is required that the manufacturing temperature not only meet the requirements of sputtering the pixel electrode film, but also be controlled within the range that the black organic photosensitive material can bear. The problem of leakage current in the gate anti-overlapping structure

Method used

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  • Array substrate, preparation method thereof and electric paper display
  • Array substrate, preparation method thereof and electric paper display
  • Array substrate, preparation method thereof and electric paper display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] figure 2 A flow chart of the method for manufacturing an array substrate provided in Embodiment 1 of the present invention, as shown in figure 2 As shown, the manufacturing method of the array substrate includes:

[0043] Step 201, depositing a source-drain metal thin film on the first substrate, and forming a pattern including source electrodes, drain electrodes and data lines through a patterning process;

[0044]Specifically, a sputtering process can be used to deposit a source-drain metal film on the first base substrate, wherein the source-drain metal film can use metal elements such as aluminum (Al), molybdenum (Mo), and neodymium (Nd); then, by The patterning process forms patterns such as source electrodes, drain electrodes, and data lines. Wherein, the region between the source electrode and the drain electrode is a TFT channel.

[0045] Step 202, depositing a semiconductor layer thin film on the first base substrate with the above pattern formed, and form...

Embodiment 2

[0055] Figure 3A The flow chart of the manufacturing method of the array substrate provided in Embodiment 2 of the present invention, on the basis of Embodiment 1, the array substrate formed by the manufacturing method of the array substrate can be used in a reflective active display (such as an electronic paper display) The main difference is that, in this embodiment, a doped semiconductor layer is included above the source electrode, the drain electrode and the data line. Such as Figure 3A As shown, the manufacturing method of the present embodiment includes:

[0056] Step 301, depositing a source-drain metal thin film and a doped semiconductor layer thin film on the first base substrate; specifically, the source-drain metal thin film can be deposited on the first base substrate by a sputtering process, and then the source-drain metal film can be deposited on the source-drain metal film by PECVD. A doped semiconductor layer film is deposited on the film. Wherein, the ma...

Embodiment 3

[0090] Figure 4A The flow chart of the manufacturing method of the array substrate provided by the third embodiment of the present invention, this embodiment can be realized based on the first or second embodiment, taking the second embodiment as an example, the difference is that this embodiment includes While doping the pattern of the semiconductor layer, the source electrode, the drain electrode and the data line, it also includes: forming a storage capacitor. Such as Figure 4A As shown, the steps of forming a pattern comprising a doped semiconductor layer, a source electrode, a drain electrode, a data line and a storage capacitor include:

[0091] Step 2011, coating photoresist on the doped semiconductor layer thin film;

[0092] Step 2012, using a mask to expose and develop the photoresist to form a photoresist pattern including a photoresist completely reserved area and a photoresist completely removed area;

[0093] Step 2013, using a dry etching process to etch aw...

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Abstract

The invention discloses an array substrate, a preparation method of the array substrate and an electric paper display. The method comprises the following steps of: depositing a source / drain metal thin film on a first substrate and forming a pattern comprising a source electrode, a drain electrode and a data line through a pattern composition process; depositing a semiconductor layer thin film and forming a pattern comprising a semiconductor layer through the pattern composition process; depositing a grid insulating layer thin film and forming a pattern comprising a grid insulating layer and a through hole through the pattern composition process, wherein the through hole is formed on the grid insulating layer, corresponding to the drain electrode, and a part of the drain electrode is exposed out of the through hole; depositing a grid metal thin film and forming a pattern comprising a grid electrode, a grid line and a pixel electrode through the pattern composition process, wherein the pixel electrode is connected with the drain electrode through the through hole; and depositing a grid electrode protection layer thin film and forming a pattern comprising a grid electrode protection layer through the pattern composition process. According to the technical scheme provided by the invention, a top grid structure is adopted to block ambient light from irradiating a TFT (thin film transistor) trench, thereby reducing the influence of leakage current on the display performance of the array substrate and improving the display quality of the array substrate.

Description

technical field [0001] The invention relates to active display technology, in particular to an array substrate, a manufacturing method thereof, and an electronic paper display. Background technique [0002] Electronic paper display is a new display device that combines the advantages of both display and paper. Its display effect is close to that of paper, and it has the advantages of flexible display, light portability, rewritable, and low power consumption. [0003] The active electronic paper display mainly includes an upper substrate, an electronic ink layer (display medium) and a lower substrate (array substrate), and usually adopts a bottom-gate anti-overlapping structure, which is composed of an upper substrate coated with electrophoretic particles and an array substrate directly bonded. The bright state is mainly displayed by the white pigment particles with good reflective ability in the electronic ink layer, and the dark state is displayed by the black particles wit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L21/027H01L27/12G02F1/167
Inventor 李文波武延兵张卓王刚
Owner BOE TECH GRP CO LTD
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