Light path interchange device based on total reflection
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- UNIV OF SHANGHAI FOR SCI & TECH
- Publication Date
- 2013-10-16
- Estimated Expiration
- Not applicable · inactive patent
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Figure 1
Abstract
Description
technical field
[0001] The invention relates to an optical path structure for laser interferometry, and belongs to the field of nanometer measurement, in particular to an optical path interchange device based on total reflection. Background technique
[0002] One of the most promising sciences of the 21st century. It involves scientific research and industrial fields such as microelectronics, optics, materials science, mechanics, biology and life sciences. Its purpose is to research, develop and process materials, devices and systems with critical dimensions close to or less than 100nm, so as to obtain A product with the required functionality and performance.
[0003] At present, there are two main categories of nanometer measurement methods: non-optical measurement methods represented by scanning probe microscopes and optical measurement methods represented by various laser interferometers. Non-optical nanometer measurement methods represented by scanning probe microscop...