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Magnetron sputtering target of magnetron sputtering film plating machine

A technology of magnetron sputtering and coating machine, which is applied in the field of magnetron sputtering targets, which can solve the problems that it is difficult to ensure the magnetic consistency of different magnetic blocks, the distribution of magnetic blocks is relatively uniform, and the temperature cannot be effectively cooled, so as to improve the operating rate and operability, improved coating effect, and simple structure

Inactive Publication Date: 2014-01-29
GUANGDONG BAOKONG INTELLIGENT EQUIP TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Vacuum sputtering coating is to use the target material to sputter, so that the sputtered material adheres to the surface of the workpiece to form a film layer, that is, to achieve coating; magnetron sputtering coating machine is a common vacuum sputtering coating equipment, however, due to the In the magnetron sputtering target, the target and the target core are relatively immobile, and the distribution of the magnetic blocks on the target core is difficult to be relatively uniform, and it is difficult to ensure that the magnetic properties of different magnetic blocks are consistent, resulting in differences in the magnetic field strength during production and uneven sputtering , affecting the coating quality, so it is preferential to improve
Furthermore, due to the high temperature generated during the magnetron sputtering process, the existing technology fails to effectively cool down the temperature, resulting in a decrease in the magnetron effect, which is not conducive to production

Method used

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  • Magnetron sputtering target of magnetron sputtering film plating machine
  • Magnetron sputtering target of magnetron sputtering film plating machine
  • Magnetron sputtering target of magnetron sputtering film plating machine

Examples

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Embodiment 1

[0024] refer to figure 1 , 2 As shown, in this embodiment, the present invention includes a target head 1 and a target material 2. The target head 1 is provided with a rotatable target core 11, and one end of the target core 11 protrudes from the target head 1 and penetrates into the middle of the target material 2. And a magnetic block 3 is distributed on the outer periphery of the part of the target core 11 that penetrates the target material 2, and the penetration end of the target core 11 is positioned on the insulating seat at the end of the target material 2; figure 2 As shown, the magnetic blocks 3 are evenly distributed according to the outer circumference of the target core 11, and one end of the target 2 with high and low magnetism is axially connected with the shell 12 of the target head 1 through the flange 4, so that the target 2. The inner cavity forms a sealed cavity 5 communicating with the inner cavity of the shell 12 of the target head. The target core 11 ...

Embodiment 2

[0029] refer to figure 1 , 2 As shown, in the present embodiment, the present invention includes a target head 1 and a target material 2. The target head 1 has a rotatable hollow cylindrical shell 12 and a target core 11. One end of the target core 11 is fixed on a fixed seat 112, and the other One end passes through the shell 12 and protrudes into the middle of the target 2, and a magnetic block 3 is distributed on the outer periphery of the part of the target core 11 that penetrates the target 2; the end of the part of the target core 11 that penetrates the target 2 Positioned on the insulating seat at the end of the target 2; the shell 12 is driven by the motor 7; one end of the target 2 is axially connected with the shell 12 of the target head through the flange 4. After the target material 2 is connected with the outer shell 12 of the target head, the inner cavity of the target material 2 and the inner cavity of the outer shell 12 of the target head form a sealed cavity...

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Abstract

The invention relates to the technical field of vacuum film plating, in particular to a magnetron sputtering target of a magnetron sputtering film plating machine. The magnetron sputtering target of the magnetron sputtering film plating machine comprises a target head and a target material, wherein the target head is provided with a target core and a shell, the target core can relatively rotate, the shell is in a hollow barrel shape, the target core is arranged in a hollow part of the shell in a penetrating way and extends inside the target material, magnet blocks are distributed at the periphery of a part (penetrating in the target) of the target core, and one end of the target material is liked with the shell of the target head together in the axial direction by a flange. According to the magnetron sputtering target, the target head is provided with the target core which can relatively rotate and the shell in the hollow barrel shape, the relative rotation between the target material and the target core can be achieved by the rotation of the target core or the shell in the hollow barrel shape, and a cooling structure is arranged, so that the sputtering is more uniform, the target can be cooled timely, the film plating effect can be improved, products with better quality can be obtained; and the magnetron sputtering target is simple in structure, scientific and reasonable, low in investment cost, and convenient to install and use, and the operation ratio and the operability of devices are greatly improved.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a magnetron sputtering target of a magnetron sputtering coating machine. Background technique [0002] Subsequently, physical vapor deposition (PVD) technology appeared, mainly for surface treatment in a vacuum environment. Physical vapor deposition itself is divided into three types: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating. It has developed quite rapidly in the past ten years. It has become one of the most advanced surface treatment methods today. Vacuum coating production is to achieve the film layer attached to the surface of the workpiece to obtain the required surface characteristics of the workpiece. Vacuum sputtering coating is to use the target material to sputter, so that the sputtered material adheres to the surface of the workpiece to form a film layer, that is, to achieve coating; magnetron sputtering coating machine is a c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 赵铭
Owner GUANGDONG BAOKONG INTELLIGENT EQUIP TECH CO LTD