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Ionizing radiation-curable protective solution for emulsion mask, and emulsion mask produced using same

A technology of ionizing radiation and protective liquid, which is applied in the field of latex masks, can solve the problems of reduced exposure accuracy and achieve the effects of excellent surface hardness, reduced production costs, and excellent adhesion

Inactive Publication Date: 2014-09-24
KIMOTO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, when laminating a surface protection film, there is a problem that exposure accuracy decreases due to a decrease in ultraviolet (UV) transmittance due to the thickness of the surface protection film, or exposure accuracy decreases due to air bubbles entering during lamination (Patent Document 1)

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Apply the ionizing radiation-curable protective solution for latex mask of Example 1 of the following composition on the latex mask body formed with a pattern by spin coating, dry at 80° C. for 2 minutes, and then irradiate ultraviolet rays for 10 seconds (1000 mJ / cm 2 ), form a protective film with a thickness of about 3 μm, and make the latex mask of Example 1.

[0059]

[0060] · Urethane acrylate oligomer 3 parts

[0061] (ART-Resin UN904: Negami Industry Co., Ltd.)

[0062] 1 part of urethane acrylate monomer

[0063] (NK Ester A-TMMT: Shin Nakamura Industrial Co., Ltd.)

[0064] ·Acrylic acid modified quaternary ammonium salt 1 part

[0065] (DMAEA-Q: Xingren Company, solid content 79%)

[0066] ·Mold release agent 0.35 parts

[0067] (Polysiloxane-modified polymer with unsaturated bond at the end group, solid content 70%)

[0068] 0.35 part photoradical polymerization initiator

[0069] (Irgacure 184: JAPAN Ciba Corporation)

[0070] · 15 parts of dil...

Embodiment 2

[0072] Apply the ionizing radiation-curable protective solution for latex mask of Example 2 of the following composition on the latex mask body formed with a pattern by spin coating, dry at 80° C. for 2 minutes, and then irradiate ultraviolet light for 10 seconds (1000 mJ / cm 2 ), form a protective film with a thickness of about 3 μm, and make the latex mask of Example 2.

[0073]

[0074] · Urethane acrylate oligomer 3 parts

[0075] (ART-Resin UN904: Negami Industry Co., Ltd.)

[0076] 1.2 parts of urethane acrylate monomer

[0077] (NK Ester A-TMMT: Shin Nakamura Industrial Co., Ltd.)

[0078] ·Acrylic acid modified quaternary ammonium salt 0.8 parts

[0079] (DMAEA-Q: Xingren Company, solid content 79%)

[0080] ·Mold release agent 0.35 parts

[0081] (Polysiloxane-modified polymer with unsaturated bond at the end group, solid content 70%)

[0082] 0.35 part photoradical polymerization initiator

[0083] (Irgacure 184: JAPAN Ciba Corporation)

[0084] · 15 parts...

Embodiment 3

[0086] Apply the ionizing radiation-curable protective solution for latex mask of Example 3 of the following composition on the latex mask body formed with a pattern by spin coating, dry at 80° C. for 2 minutes, and then irradiate ultraviolet rays for 10 seconds (1000 mJ / cm 2 ), form a protective film with a thickness of about 3 μm, and make the latex mask of Example 3.

[0087]

[0088] · Urethane acrylate oligomer 2 parts

[0089] (ART-Resin UN904: Negami Industry Co., Ltd.)

[0090] 1.2 parts of urethane acrylate monomer

[0091] (NK Ester A-TMMT: Shin Nakamura Industrial Co., Ltd.)

[0092] · Acrylic acid modified quaternary ammonium salt 2 parts

[0093] (DMAEA-Q: Xingren Company, solid content 79%)

[0094] ·Mold release agent 0.35 parts

[0095] (Polysiloxane-modified polymer with unsaturated bond at the end group, solid content 70%)

[0096] 0.35 part photoradical polymerization initiator

[0097] (Irgacure 184: JAPAN Ciba Corporation)

[0098] · 15 parts o...

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PUM

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Abstract

Disclosed are: a protective solution for an emulsion mask, which enables the formation of a protective film within a short time and can provide excellent adhesion of an emulsion mask having the protective film formed thereon and excellent surface hardness of the emulsion mask; and an emulsion mask produced using the protective solution. Specifically disclosed is an ionizing radiation-curable protective solution for an emulsion mask, which comprises a (meth)acrylate oligomer and / or a (meth)acrylic monomer and a reactive hydrophilic substance capable of being copolymerized with the oligomer and / or the monomer. The reactive hydrophilic substance comprises a (meth)acrylic modified hydrophilic substance, particularly comprises a (meth)acrylic modified phosphoric acid ester and / or a (meth)acrylic modified quaternary ammonium salt.

Description

technical field [0001] The present invention relates to an ionizing radiation-curable protective solution for latex masks, which can be used to shorten the time for forming a protective film, and in particular to latex masks with excellent adhesion between latex masks and protective films and surface hardness of the protective film Use ionizing radiation-curable protective fluid and latex mask. Background technique [0002] Usually, for the latex mask that is patterned with silver salt emulsion (emulsion) as a light-shielding film on substrates such as soda glass (soda glass), quartz glass, optical glass, etc., the light-shielding film is easy to scratch because of softness, It is impossible to perform wet washing with a solvent or the like. In addition, as the size of the glass mask increases, the accuracy decreases due to bending due to its own weight, etc., so that the problem of abrasion of the light-shielding film occurs when contact exposure is performed to improve th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/48G03F1/54
CPCG03F7/027G03F1/54G03F1/48
Inventor 根岸朋子长谷川刚
Owner KIMOTO CO LTD