66results about How to "Good anti-reflection performance" patented technology

There is disclosed an anti-reflection film material used in lithography containing at least a polymer compound having repeating units for copolymerization represented by the following general formula (1), or those containing a polymer compound having repeating units for copolymerization represented by the following general formula (2) and a polymer compound having repeating units for copolymerization represented by the following general formula (3). There can be provided an anti-reflection film material which has an excellent reflection preventive effect to exposure at short wavelength, and has high etch selectivity, namely, an etch rate is higher enough than the photoresist film, an etch rate is sufficiently slower than a substrate to be processed, wherein the shape of the resist pattern formed in the photoresist film on the anti-reflection film can be made perpendicular

An anti-reflection coating comprising first to seventh layers formed on a substrate in this order, the first layer being an alumina-based layer, the seventh layer being a porous, silica-based layer, and each of the first to seventh layers having predetermined refractive index and optical thickness in a wavelength range of 400-700 nm.

The present invention provides an antireflective film including at least an antireflective layer and a base resin layer, the base resin layer including at least layers a and b respectively including a thermoplastic resin as a main component, the layer a having a flexural modulus higher than that of the layer b, and the layer a being closer to the antireflective layer than the layer b, a polarizer plate obtained by bonding the antireflective film to a polarizer, and a display including the polarizer plate. According to the present invention, an antireflective film in which an antireflective layer is stacked on a transparent resin substrate and exhibits excellent antireflective performance, tenacity, and surface hardness, a polarizer plate using the antireflective film, and a display including the polarizer plate are provided.

An antireflective film is provided and includes: a support; and a low refractive index layer formed from a composition for low refractive index layer, the composition including the components (A) and (B):

• • (A) a fluorine-containing polymer having a crosslinking group, and
  • (B) a conductive polymer composition including a π-conjugated conductive polymer and a polymer dopant having an anion group, the conductive polymer composition being hydrophobized. The antireflective film has a Log SR of 13 or less, Log SR being a common logarithm of a surface resistivity SR (Ω/sq) of a surface on a side having the low refractive index layer with respect to the support.

Provided is a low cost, transparent conductive film having good antireflection properties. The transparent conductive film: has a transparent conductive membrane on one surface of a base material film having a refractive index of 1.6-1.7; and has only one low-refractive index layer having a refractive index of no more than 1.42 and a thickness of 80-120 nm, on the other surface of the base material film, having a highly adhesive layer therebetween. The highly adhesive layer fulfills condition 1, condition 2, or condition 1 and condition 2. Condition 1: The absolute value for the difference between the refractive index of the base material film and the refractive index of the highly adhesive layer is no more than 0.08. Condition 2: The thickness of the highly adhesive layer is at least 5 nm and less than 50 nm.

The invention relates to a positive/negative (P/N) heterojunction based silicon/titanium dioxide three-dimensional composite material with synergic anti-reflection performance. The silicon/titanium three-dimensional composite material is prepared according to the following method of (1) firstly, carrying out anisotropic etching on a silicon wafer with an alkali liquid, and forming a closely-arranged square conical shape on the surface of the silicon wafer; (2) secondly, carrying out hydrophilic treatment on the silicon wafer etched in the step (1), growing titanium dioxide crystal seed on the surface of the silicon wafer, and placing the silicon wafer in a muffle for calcination; and (3), finally, placing the silicon wafer with the titanium dioxide crystal seed on the surface, obtained in the step (2), in a reaction kettle, and obtaining the silicon/titanium dioxide three-dimensional composite material by adopting a hydrothermal method. The composite material disclosed by the invention is compatible with capabilities of excellent reflection elimination and high-efficiency photo-induced charge separation, and can be applied to the fields such as photocatalysis, a photoelectric conversion device and a solar cell.

Thin-type circular polarization light panel with excellent reflective property, a making method of the circular polarization light panel, and a display device provided with the circular polarization light panel are provided in the invention. The circular polarization light panel and (continuous) making method are provided, and the display device provided with the circular polarization light panel and display elements like an organic EL display element is also provided. The circular polarization light panel is characterized in that a liquid crystal phase difference layer formed by compositions is formed by the liquid crystal phase difference layer containing polymerism liquid crystal composition, a phase difference layer is formed by phase difference film formed by stretching polymeric membrane, a polarized light layer is formed by compositions formed by polarized light layers containing dichroism pigmental, and the three layers are arranged in such a sequence.

Disclosed is an integrated film-like optical filter wherein an antireflective layer is formed on one side of a transparent base (such as a PET film), a composite layer including an electromagnetic shielding layer and a near-infrared blocking layer is bonded to the other side of the transparent base, and the exposed surface of the composite layer has adhesive properties. This optical filter is light in weight and is easy to produce and handle. In addition, the optical filter is excellent in in-use durability and visibility of visible images, and is useful as an optical filter for display surfaces of plasma displays or the like.

The invention provides a paint for transparent film and transparent film coated substrate formed by once coating the paint for transparent film and drying, with good sealing property, intension, antireflection and antidazzle performance, producibility and economical efficiency. The paint for transparent film comprises: particles of low refractive index with different affinity to the substrate forming component and particles of high refractive index, substrate forming component, polymerization initiator and solvent, characterized in that the particles of low refractive index and particles of high refractive index are subjected to surface treatment by silane coupler, therefore the refractive index (nA) of the particles of low refractive index (A) is at the range of 1.20-1.45, and the mean diameter is at the range of 5-200nm, the surface charge amount (QA) is at the range of 5-80ueq/g and the refractive index (nB) of the particles of high refractive index (B) is higher than the nA, and the mean diameter is at the range of 0.5-5um, the surface charge amount (QB) is at the range of 25-100ueq/g and the concentration of the particles of low refractive index is at the range of 0.1-10 weight% calculated in solid component and the concentration of the particles of high refractive index is at the range of 0.1-10 weight% calculated in solid component and the concentration of the substrate forming component is at the range of 1-30 weight% calculated in solid component.

The invention relates to the technical field of photoelectric materials, in particular to an anti-reflecting heterojunction composite coating and a preparation method thereof. Firstly, the anisotropy of alkali liquor is used for etching monocrystalline silicon, and a conical structure in micron size is obtained; then, by a soft template printing technology, the silicon cone structure is transferred to the surface of a rigid base, wherein the surface of the rigid base is attached to a transition metal oxide, and a conical transition metal oxide is obtained; finally, by an in-situ oxide method, conductive macromolecule nano particles grow on the surface of the conical transition metal oxide, and a transition metal oxide and conductive macromolecule composite coating using the rigid base as a carrier is formed. The composite coating has the micro-nano multistage structure, so that excellent anti-reflecting performance is realized; meanwhile, a p-n heterojunction is formed at a transition metal oxide and conductive macromolecule assembly boundary surface; the efficient photogenerated charge separation capability is given to the composite coating; the photoelectric converting efficiency is improved. The composite coating effectively utilizes incident light, and has high application prospects as a photoelectric material.

An excellent heat-resistant electroconductive nitride film containing Ti and/or Zr, and at least one metal selected from the group consisting of Al, Mo, Cr, Nb, Hf, Ni, Co, Fe, Pd, Ag, Au and Pt, its production method and an antireflector using the electroconductive nitride film.

The invention relates to anti-reflecting glass and a method for preparing the anti-reflecting glass through secondary acid corrosion. The method aims to obtain zero-reflecting Na2O-CaO-SiO2 system glass and greatly improve the optical transmissivity of the glass. The method is realized through the following technical scheme: a glass matrix is put in two acidic solution corrosion tanks to be corroded orderly; and after being taken out and cleaned, the glass matrix is put in a drying oven to be dried, therefore, the anti-reflecting glass is obtained. The method has the advantages that the cost is low, and the glass is optimal in anti-reflection performance and anti-reflection bandwidth; and the visible-light double-face reflectivity of the glass is lower than 0.5%. The visible light transmissivity of ultra-white sheet glass treated by the method exceeds 99%, while the anti-reflection bandwidth having the transmissivity greater than 96% reaches up to 1200 nm; and the anti-reflection performance of the ultra-white sheet glass reaches international advanced level.

The invention relates to a Si-TiO2-PANI (silicon-titanium dioxide-polyaniline) composite material assembled based on a ternary hierarchy. The composite material is prepared according to the following steps of (1) performing hydrophilic treatment on a silicon wafer, growing TiO2 seed crystal on the surface of the silicon wafer, putting the silicon wafer into a muffle furnace, and roasting the silicon wafer in the muffle furnace for a certain time; (2) putting the silicon wafer which is obtained in the step (1) in a reaction kettle, wherein the TiO2 seed crystal is adhered to the surface of the silicon wafer, and growing a TiO2 nano-rod on the surface of the silicon wafer in an inducing manner by utilization of a hydro-thermal synthesis method; (3) depositing conductive polyaniline nanoparticles on the TiO2 nano-rod obtained in the step (2) so as to obtain the Si-TiO2-PANI composite material assembled based on the ternary hierarchy. The Si-TiO2-PANI composite material assembled based on the ternary hierarchy disclosed by the invention has the advantages of excellent capabilities of lowering light reflection on a material surface and effectively separating photo-generated charges, and can be applied to photoelectric conversion devices, solar cells and photocatalytic organic dyestuff degradation.

Disclosed is a liquid curable resin composition containing (A) a fluorine-containing polymer having a hydroxyl group and/or a fluorine-containing polymer having an ethylenically unsaturated group, (B) a curable compound, (C) a curing catalyst, (D) silicon dioxide particles having a number-average particle diameter of not more than 100 nm and (E) a solvent having an sp value of more than 8.5 and less than 12.8. When this liquid curable resin composition is applied to a base and the solvent is removed therefrom, the coating is separated into two layers, namely a layer wherein silicon dioxide exists at high density and a layer wherein substantially no silicon dioxide exists. By curing this coating, there can be obtained a cured film which has excellent adhesion to the base, high abrasion resistance and good antireflection effects.

The invention discloses a crystalline silicon solar battery. The crystalline silicon solar battery comprises an Al electrode, a back ZnO-based thin film layer, a p-type Si substrate layer, an n-type Si diffusion layer, a front ZnO-based thin film layer and an Ag main electrode thick line in turn. The crystalline silicon solar battery has the advantages of high photoelectric conversion efficiency, high stability, simple process, and low production cost, and can improve the performance and prolong the service life of the crystalline silicon solar battery.

The invention discloses laser transfer paper based on combination of water-based materials and a preparation method of the laser transfer paper. The laser transfer paper based on combination of the water-based materials comprises a moisture preserving layer, a backing paper layer, a glue layer, a metal vacuum plating layer, a laser transfer layer and a varnish layer which are stacked sequentially,wherein the glue layer is a self-crosslinking modified acrylate layer; the laser transfer layer is a modified polyurethane layer; the moisture preserving layer, the glue layer, the laser transfer layer and the varnish layer are all prepared from water-based resin; film-forming resin of the modified polyurethane layer is Xinrui DFW-09. Materials used by the laser transfer paper based on combination of the water-based materials are all water-based environment-friendly materials, the environmental performance is good, the laser transfer paper based on combination of the water-based materials isgood in continuous mold pressing performance, better in brightness, good in folding resistance and excellent in gloss loss resistance, plate blocking in mold pressing is avoided, and continuous stripping can be realized.

The invention provides an environment-friendly track and field runway. The environment-friendly track and field runway is prepared from the main raw materials of 58-62% of Pvc paste resin, 35-39% of dioctyl terephthalate, 1-3% of a calcium-zinc stabilizer and 0.5-2% of azodicarbonamide. The invention further provides a preparation method of the environment-friendly track and field runway. Four substances are mainly adopted for matching, the environment-friendly track and field runway has the advantages of being good in damping effect, excellent in rebounding performance, large in adhesive force, high in spike resisting capability, good in slip resistance and wear resistance and the like and can be widely applied to pavement materials for athletic grounds, and the maintenance frequency can be reduced in application of the environment-friendly track and field runway.

The invention relates to an antireflective double layer P/N heterojunction graded composite material with monocrystalline silicon as a carrier. A preparation method of the composite material comprises the following steps: 1, carrying out hydrophilic treatment on a silicon chip, growing titanium dioxide seeds on the growth of the hydrophilically treated silicon chip, and calcining the obtained silicon chip in a muffle furnace; 2, placing the silicon chip with the surface attached with the titanium dioxide seeds, obtained in step 1, in a reaction kettle, and inducing growth of titanium dioxide nano-rods on the surface of the silicon chip through a hydrothermal synthesis technology; and 3, depositing the titanium dioxide nano-rods on polypyrrole nano-particles obtained in step 2 to obtain the antireflective double layer P/N heterojunction graded composite material with monocrystalline silicon as a carrier. The antireflective double layer P/N heterojunction graded composite material with monocrystalline silicon as a carrier has excellent material surface light reflection reduction and efficient photo-induced charge separation ability, and can be applied in the fields of photocatalysis, photoelectric conversion devices and solar batteries.

The invention discloses an optical element having an anti-reflection function and a method for producing the same. The optical element includes a base having a first main surface and a second main surface; a plurality of structures composed of projections or recesses and arranged on the first main surface at a fine pitch equal to or less than the wavelength of visible light for which the amount of reflection is to be reduced; and a light-absorbing layer that absorbs the light and that is disposed on the second main surface, wherein the structures are arranged so as to form a plurality of rows of tracks on the first main surface and form a hexagonal lattice pattern, a quasi-hexagonal lattice pattern, a tetragonal lattice pattern, or a quasi-tetragonal lattice pattern, and the structures each have an elliptical cone shape or a truncated elliptical cone shape, the major axis direction of which is a direction in which the tracks extend.