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Apparatus and method for coating glass substrate

A technology for equipment and substrates, applied in the field of equipment for coating glass substrates, can solve problems such as reducing the quality of the coating layer

Inactive Publication Date: 2013-03-20
BENEQ OY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The problem with these traditional prior art vapor deposition methods is that the starting material is vaporized away from the surface of the substrate to be coated and the vaporized starting material is transported to the substrate by a carrier gas
Undesirably formed particles do not terminate until the surface of the substrate to be coated, thus reducing the quality of the resulting coating layer

Method used

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  • Apparatus and method for coating glass substrate
  • Apparatus and method for coating glass substrate
  • Apparatus and method for coating glass substrate

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Embodiment Construction

[0017] in general, figure 1 A first embodiment of the present invention is shown in which forming the coating layer on the glass substrate 15 is performed in a coating apparatus. The flat glass substrate 15 has typical dimensions of 1100 mm x 1400 mm, moving from right to left. The glass substrate 15 first enters a heating furnace 24 including a heater 25 . Heater 25 may be based on radiation, convection or the like. In the heating furnace 24 , the glass substrate 15 is heated to a temperature higher than the annealing point (annealing temperature) of the glass substrate 15 . The annealing point depends on the composition of the glass substrate 15 and is typically about 500° C. for soda-lime glass and about 1100° C. for fused silica. The glass substrate 15 then enters the coating unit 26 in which the droplets 3 are deposited on the glass substrate 15 or is directed towards the glass substrate 15 in the deposition chamber 16 . The air flotation device 27 floats the glass su...

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PUM

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Abstract

The invention relates to a method and apparatus for coating a substrate (15) using one or more liquid starting materials. The substrate is coated by atomizing one or more liquid starting materials into droplets (3) and vaporizing the droplets (3) in a deposition chamber (16) for before the starting materials react on the surface of the substrate (15). According to the present invention the droplets (3) are guided towards the substrate (15) with electrical forces before the droplets (3) are vaporized.

Description

technical field [0001] The invention relates to an apparatus for coating glass substrates, more particularly to an apparatus according to the preamble of claim 1 . The invention also relates to a method for coating a glass substrate, more particularly to a method according to the preamble of claim 18 . Background technique [0002] It is generally known to use liquid starting materials for coating glass in the following manner: atomizing the liquid starting materials into droplets and directing the formed droplets onto the surface of the glass substrate to be coated to produce a coating Floor. In other words, according to the prior art, the droplets are brought as liquid droplets onto the surface of the substrate to be coated, whereby a coating layer is formed on the substrate surface, such that the droplets brought onto the surface are first pyrolyzed Alternatively vaporizable droplets are vaporized to provide a coating layer on the surface of the substrate. [0003] The...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/448
CPCC23C16/545B05B5/043C03C17/002B05B5/03C23C16/4486B05B5/005C23C16/452
Inventor M·拉贾拉K·扬卡S·考皮宁A·霍维宁
Owner BENEQ OY