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Radio frequency impedance matcher

An impedance matcher and impedance matching technology, which is applied in the direction of plasma, electrical components, etc., can solve the problems of long matching time of manual RF impedance matcher and the inability to track the change of load impedance in time, and achieve the effect of accurate automatic impedance matching

Inactive Publication Date: 2013-04-03
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem that the existing manual RF impedance matcher has a long matching time and cannot track the change of load impedance in time, the present invention provides a RF impedance matcher, which is connected between the RF power supply and the plasma chamber through a transmission line Between, the RF impedance matcher includes:

Method used

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Embodiment Construction

[0019] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0020] In the embodiment of the present invention, the radio frequency impedance matcher is connected between the radio frequency power supply and the plasma chamber through a transmission line. like figure 2 As shown, the radio frequency impedance matcher includes a signal detection module, a control module and an impedance matching execution module. in:

[0021] The signal detection module is used to detect the incident power of the radio frequency power supply and the reflected power of the transmission line, and output the detection results. Further, the signal detection module includes an incident power detection unit and a reflected power detection unit; the incident power detection unit is used to detect the amplitude and phase information of the incident power of the radio frequency power supply, and output the dete...

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Abstract

The invention discloses a radio frequency impedance matcher, and belongs to the technical field of semiconductor manufacturing. The radio frequency impedance matcher is connected between a radio frequency power supply and a plasma cavity through a conveying line and comprises a signal detection module, a control module and an impedance matching execution module, wherein the signal detection module is used for detecting the incident power of the radio frequency power supply and the reflection power of the conveying line, and outputting detection results; the control module is used for receiving the detection results output by the detection module, calculating according to a preset impedance matching control algorithm, generating and transmitting control signals; and the impedance matching execution module is used for receiving the control signals transmitted by the control module, adjusting an impedance matching network according to the control signals and realizing the impedance matching between the plasma cavity and the conveying line. The radio frequency impedance matcher provided by the invention can track the impedance change of the plasma cavity in real time and automatically adjust the impedance matching network to realize the rapidly and accurately automatic impedance matching.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a radio frequency impedance matcher. Background technique [0002] RF impedance matchers are widely used in the field of semiconductor manufacturing technology. The RF power supply (with a constant output impedance of 50Ω and a frequency of usually 13.56MHZ) provides RF power to the plasma chamber. Usually the impedance of the plasma chamber is not equal to the characteristic impedance of the transmission line (usually 50Ω in semiconductor equipment), so there is a serious impedance mismatch problem between the RF power supply and the plasma chamber, and there is reflected power on the transmission line, which affects the plasma. The body compartments work normally, sometimes with fatal consequences. [0003] The solution in the prior art is: insert a radio frequency impedance matcher between the radio frequency power supply and the plasma chamber, and reali...

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Application Information

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IPC IPC(8): H05H1/46
Inventor 孙小孟李勇滔赵章琰李英杰秦威夏洋
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI