Chemical vapor deposition equipment and surface temperature detection method of top board thereof

Abstract

The invention relates to CVD (Chemical Vapor Deposition) equipment and a surface temperature detection method of a top board arranged in a way of being opposite to a substrate supporting base. The CVD equipment comprises a cavity, the top board arranged inside the cavity and the substrate supporting base; the top board and the substrate supporting base are oppositely arranged; the substrate supporting base is provided with a substrate supporting face facing to the top board; the top board is provided with a first surface facing to the substrate supporting base and a second surface departing from the substrate supporting base; the CVD equipment further comprises at least one probing hole and at least one temperature prober; the probing hole extends from the outer side of the cavity toward the inside of the cavity, and extends from one side of the second surface of the top board to the top board, but does not penetrate through the top board; and the temperature prober probes a temperature of the top board through the probing hole, so that a temperature of the first surface of the top board is obtained. The CVD equipment provided by the invention can be used for effectively detecting the temperature of the first surface of the top board, which faces to the substrate supporting base.

Description

technical field [0001] The present invention relates to a semiconductor processing equipment and a method for detecting the surface temperature of a top plate opposite to a substrate support in the semiconductor processing equipment, in particular to a chemical vapor deposition (CVD) Set the surface temperature detection method of the top plate. Background technique [0002] At present, chemical vapor deposition (CVD) equipment, such as: plasma enhanced chemical vapor deposition (PECVD) equipment, low pressure chemical vapor deposition (LPCVD) equipment, metal organic chemical vapor deposition (MOCVD) equipment has been widely used in the field of semiconductor device manufacturing. The chemical vapor deposition equipment in the prior art will be briefly described below by taking metal organic chemical vapor deposition (MOCVD) equipment as an example. [0003] see figure 1 , figure 1 It is a structural schematic diagram of an MOCVD device in the prior art. The MOCVD equi...

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Problems solved by technology

[0007] The chemical vapor deposition equipment has a surface facing the substrate support seat. The existing chemical vapor deposition equipment has the problem that the temperature of the surface cannot be effectively detected. The present invention provides a chemical vapor deposition equipment that can solve the above problems

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