Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Coplanar three-axis positioning device

A shaft positioning, coplanar technology, applied in the directions of transportation and packaging, conveyor objects, furnaces, etc., can solve the problem of the influence of inertial inertia, the platform device does not have the function of rotation, etc., and achieves a large displacement range and a thin volume. Effect

Active Publication Date: 2015-10-21
METAL INDS RES & DEV CENT
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this patent is that the platform device does not have a rotation function. If the rotation function is required, a rotating shaft must be installed on the platform device.
Then the patented X-axis displacement platform is set on the Y-axis displacement platform. When the weight of the workpiece is heavy, the influence of inertial inertia will occur in the state of high-speed positioning.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Coplanar three-axis positioning device
  • Coplanar three-axis positioning device
  • Coplanar three-axis positioning device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0073] In order to have a further understanding and understanding of the structural features of the present invention and the achieved effects, the preferred embodiments and accompanying drawings are used for a detailed description, as follows:

[0074] see figure 1 , which is a perspective view of the first embodiment of the present invention; as shown in the figure, this embodiment provides a coplanar three-axis positioning device 1, which can mainly perform a first direction (moving along the X axis) on the same plane , a movement in a second direction (moving along the Y axis) or a third direction (rotating around the Z axis), and then the precision of the coplanar three-axis positioning device 1 reaches sub-micron level. The coplanar three-axis positioning device 1 includes a fixed platform 10 , a first driving module 12 , two second driving modules 14 and a positioning module 16 . The fixed platform 10 has a first side 101 and two second sides 102 , the first side 101 i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

This invention relates to a coplanar three-axis positioning device, comprising a fixed platform, a first driving module, two second driving modules and a positioning module, wherein the positioning module comprises a positioning platform, a first driving shaft and two second driving shafts. The first driving module and the two second driving modules drive the first driving shaft and the two second driving shafts to drive the positioning platform carrying a workpiece to make movement in a first direction, a second direction or a third direction on the same surface, so as to position a location of the workpiece. The coplanar three-axis positioning device provided by the invention has simple structure and small size and is easy to modularize. Besides, the positioning precision of the coplanar three-axis positioning device provided by the invention can reach a submicron level.

Description

technical field [0001] The present invention relates to a positioning device, in particular to a sub-micron positioning device capable of moving in a first direction (X axis), a second direction (Y axis) or a third direction (θ axis) on the same plane. Background technique [0002] In recent years, the research and development of nanotechnology has been quite remarkable. Many high-tech industries, such as semiconductors, information, electronics, communications, optoelectronics and other technical fields, have developed their processing and manufacturing technologies towards ultra-miniaturization and precision. Therefore, the demand for micron or even nanometer-level precision positioning devices has also increased significantly, and whether the alignment and positioning accuracy of precision positioning devices can meet the standard is also the key to the success or failure of the process quality of related industries. [0003] For this reason, in the production process of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/68B65G49/06
Inventor 刘冠志洪国凯
Owner METAL INDS RES & DEV CENT
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com