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Micro-Electro-Mechanical Systems (MEMS) Structures and Design Structures

A micro-electromechanical system and beam structure technology, applied in the direction of microelectronic microstructure devices, microstructure technology, microstructure devices, etc., can solve problems such as small modulation ranges

Active Publication Date: 2015-10-28
INT BUSINESS MASCH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, known MEMS varactors have the disadvantage of a small modulation range (<3:1) caused by the "snap down" effect

Method used

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  • Micro-Electro-Mechanical Systems (MEMS) Structures and Design Structures
  • Micro-Electro-Mechanical Systems (MEMS) Structures and Design Structures
  • Micro-Electro-Mechanical Systems (MEMS) Structures and Design Structures

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Embodiment Construction

[0021] The present invention relates to semiconductor structures and methods of fabrication, and more particularly to microelectromechanical systems (MEMS) structures, methods of fabrication and designed structures. More specifically, in embodiments, the invention relates to tunable MEMS varactors having a linear response to applied voltage and various process steps for forming such MEMS varactors. Those of ordinary skill in the art should understand that the present invention is not limited to MEMS varactors, and the method and structure of the present invention can be applied to any MEMS rf device or other devices such as MEM contact switches, bulk acoustic wave resonators and the like.

[0022] Advantageously, the invention can be used as a varactor whose capacitance varies with applied voltage. More specifically, the present invention provides an improved linear modulation range of at least 3.5:1, and in embodiments may exceed a modulation range of 10.5:1. The varactor of...

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PUM

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Abstract

Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are disclosed. The method includes forming at least one fixed electrode on a substrate. The method further includes forming a Micro-Electro-Mechanical System (MEMS) beam with a varying width dimension, as viewed from a top of the MEMS beam, over the at least one fixed electrode.

Description

technical field [0001] The present invention relates to semiconductor structures and methods of fabrication, and more particularly to microelectromechanical systems (MEMS) structures, methods of fabrication and designed structures. Background technique [0002] A varactor is a device whose capacitance varies with an applied voltage. Varactors are typically fabricated with MOS capacitors whose depletion region varies with applied voltage, resulting in about a 3:1 variation in capacitance. Silicon varactors (eg, solid-state varactors) have poor isolation from the silicon substrate and their modulation range is limited. [0003] Typically, solid state varactors are used where adjustable capacitance is required. However, solid-state varactors offer a very limited modulation range and have high resistive losses and relatively high power dissipation. For example, in solid-state varactor diodes, the capacitance of the varactor is set by the bias current generated by a subcircuit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00B81C99/00B81B3/00
CPCB81B3/0008B81B3/001B81B3/0013B81B2201/0221B81B2203/0109B81B2203/0118B81B2203/019H01G5/18B81B3/0043B81C1/0015
Inventor C·V·亚恩斯A·K·斯塔珀
Owner INT BUSINESS MASCH CORP