Pupil correction method and lithography exposure system for compensating lithography imaging quality
A technology of imaging quality and light compensation, applied in the direction of microlithography exposure equipment, photolithography process exposure device, etc., can solve the problem of the difference between the exposure effect of the lithography machine and the target value, shorten the operation time, ensure the operation accuracy, and improve the algorithm concise effect
Active Publication Date: 2015-08-26
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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[0003] Due to the limitations of the production process, changes in the use environment and other factors, the actual exposure effect of the lithography machine will be different from the target value
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[0021] A pupil correction method and a lithography exposure system for compensating lithography imaging quality according to a specific embodiment of the present invention will be described in detail below with reference to the accompanying drawings. However, the present invention should be understood as not limited to such embodiments described below, and the technical idea of the present invention can be implemented in combination with other known technologies or other technologies having the same functions as those known technologies.
[0022] In the following description, in order to clearly show the structure and working method of the present invention, many directional words will be used to describe, but "front", "rear", "left", "right", "outer", "inner" should be used Words such as ", "outward", "inward", "upper" and "lower" are to be understood as convenient terms, and should not be understood as restrictive terms.
[0023] The present invention introduces the princi...
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The invention discloses a pupil correction method for compensating image quality of photolithography. The pupil correction method comprises the steps of assigning a plurality of mask plates and pupils of projection lens to obtain images of a plurality of lighting sources and establish a relationship between the main components of the lighting sources and space images; selecting a group of the mask plates and the pupils from the assignment, performing principal component analysis on nominal light sources to obtain nominal weight of each principal component; and calculating target weight of each nominal principal component by using a lookup table algorithm and a linearity regression algorithm in combination of the relationship between the main components of the lighting sources and the space images, thus obtaining setting variations of the light source parameters and adjustment amount of movable components in the light sources. At the same time, the invention discloses a lithography exposure system for compensating the image quality of the photolithography.
Description
technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a pupil correction method and a photolithography exposure system for compensating photolithography imaging quality. Background technique [0002] Lithography equipment is a kind of equipment used in the manufacture of integrated circuits. The uses of this equipment include but are not limited to: photolithography equipment for integrated circuit manufacturing, liquid crystal panel lithography equipment, photomask marking equipment, MEMS (micro-electromechanical systems) / MOMS (micro-optical machine system) lithography equipment, advanced packaging lithography equipment, printed circuit board lithography equipment and printed circuit board processing equipment, etc. [0003] Due to the limitations of the production process, changes in the use environment and other factors, the actual exposure effect of the lithography machine will be different from the tar...
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IPC IPC(8): G03F7/20
Inventor 施忞阎江杨志勇白昂力孙文凤
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD