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Method for producing semiconductor component and field effect semiconductor component

A semiconductor and component technology, applied in the related semiconductor component field, can solve the problems of increased switching loss, high capacitance, etc.

Inactive Publication Date: 2013-07-17
INFINEON TECH AUSTRIA AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But this results in higher capacitance
Therefore, switching losses may increase

Method used

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  • Method for producing semiconductor component and field effect semiconductor component
  • Method for producing semiconductor component and field effect semiconductor component
  • Method for producing semiconductor component and field effect semiconductor component

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which are shown by way of illustrations specific embodiments in which the invention may be practiced. In this regard, directional terms such as "top", "bottom", "front", "back", "leading", "rear (trailing)", etc., are used with reference to the orientation of the figure being described. Because elements of an embodiment may be oriented in many different orientations, directional terminology is used for purposes of description and is in no way limiting. It is to be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. Accordingly, the following detailed description should not be taken in a limiting sense, and the scope of the invention is defined by the appended claims.

[0013] Reference will now be made in detail to various embodiments, one or more e...

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Abstract

A method for producing a semiconductor component and a field effect semiconductor component are described. The method includes providing a semiconductor body having a first surface and being comprised of a first semiconductor material extending to the first surface. At least one trench extends from the first surface into the semiconductor body and includes a gate electrode insulated from the semiconductor body and arranged below the first surface. The method further includes: forming a second insulation layer on the first surface with a recess that overlaps in projection onto the first surface with the conductive region; forming a mask region in the recess; etching the second insulation layer selectively to the mask region and the semiconductor body to expose the semiconductor body at the first surface; depositing a third insulation layer on the first surface; and etching the third insulation layer so that a semiconductor mesa of the semiconductor body arranged next to the a least one trench is exposed at the first surface.

Description

technical field [0001] Embodiments of the invention relate to methods for fabricating semiconductor components having trench contacts which are self-aligned to groove gate electrodes, in particular to having field electrodes arranged below the gate electrodes semiconductor transistors, and related semiconductor components. Background technique [0002] Semiconductor transistors, particularly field effect controlled switching devices such as metal oxide semiconductor field effect transistors (MOSFETs) or insulated gate bipolar transistors (IGBTs), have been used in a variety of applications including, but not limited to, as power supplies and power converters , electric cars, air conditioners, and even switches in stereo systems. Especially for power devices capable of switching large currents and / or operating at higher voltages, low switching losses are often desired. In order to reduce switching loss, research and development to reduce the distance between adjacent unit c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/336H01L21/331H01L21/28H01L29/78H01L29/739H01L29/40H01L29/423
CPCH01L29/407H01L21/0337H01L21/765H01L29/66734H01L29/401H01L21/28H01L29/78H01L29/41766H01L21/31144H01L29/7813H01L29/4236H01L29/66727H01L29/6634H01L29/66719H01L29/7397H01L21/76897H01L29/40114H01L21/308H01L29/0696H01L29/1095H01L29/41708H01L29/66348
Inventor 马丁·佩尔茨尔
Owner INFINEON TECH AUSTRIA AG