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An altimeter stand

A technology for placing a table and an altimeter, applied to measuring devices, instruments, etc., can solve the problems of increased difficulty of precision, error generation, complex structure, etc., and achieve the effect of reducing measurement errors, improving detection precision, and simple structure

Active Publication Date: 2016-04-20
SUZHOU SUTENG ELECTRONICS TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Some tooling parts to be tested have a relatively simple structure, so the measurement method is relatively easy, while some tooling parts to be tested are relatively difficult to measure their precision due to their complex structure, and some even need to combine several measuring instruments for indirect measurement
However, no matter how precise the measuring instruments are, errors may occur during measurement. The errors are mainly caused by factors such as measuring instruments, measuring methods, measuring environments, and measuring personnel. In order to reduce measurement errors, the placement table for measuring instruments also needs to be carefully designed.

Method used

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  • An altimeter stand

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Embodiment Construction

[0015] The present invention will now be further described in detail in conjunction with the accompanying drawings and embodiments. These drawings are all simplified schematic diagrams, only illustrating the basic structure of the present invention in a schematic manner, so it only shows the composition related to the present invention.

[0016] like figure 1 As shown, the present invention provides an altimeter placement platform, which includes six support legs 2, a first placement platform 1 and a second placement platform 5 lower than the first placement platform 1, and one side of the second placement platform leans against On the above-mentioned first placement platform, the above-mentioned first placement platform 1 is provided with an upper placement platform 2 and a lower placement platform 8, and the sides of the upper placement platform 2 and the lower placement platform 8 are all provided with a first square hole 4, and the above-mentioned A second square hole 4 is...

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Abstract

The invention relates to an altimeter placing platform which comprises supporting legs, a first placing platform and a second placing platform lower than the first placing platform. One edge of the second placing platform abuts against the first placing platform, an upper placing platform face and a lower placing platform face are arranged on the first placing platform, the side edge of the upper placing platform face and the side edge of the lower placing platform face are respectively provided with a first square hole, and a second square hole is formed in the side edge, abutting against the first placing platform, of the second placing platform. The altimeter placing platform is simple in structure, the outline, the height and the size of the altimeter placing platform are strictly designed according to actual measuring needs, the placing platform is beneficial for reducing measuring errors, and detecting precision is improved. The altimeter placing platform is ingeniously designed to be the two placing platforms with different heights, two altimeters can be placed on the altimeter placing platform and are used for detecting tooling parts simultaneously, and detecting precision is improved.

Description

technical field [0001] The invention relates to a precision workpiece detection device, in particular to an altimeter placement platform. Background technique [0002] In the tooling and parts processing industry, it is usually necessary to measure the processed tooling parts to ensure that the product specifications of the tooling parts meet the standards. Common measuring instruments include altimeters, height gauges, vernier calipers, and outer micrometers. Some tooling parts to be tested have a relatively simple structure, so the measurement method is relatively easy, while some tooling parts to be tested are relatively difficult to measure their precision due to their complex structure, and some even need to combine several measuring instruments for indirect measurement. However, no matter how precise the measuring instruments are, errors may occur during measurement. The errors are mainly caused by factors such as measuring instruments, measuring methods, measuring en...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B21/02
Inventor 周天毫
Owner SUZHOU SUTENG ELECTRONICS TECH
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