Multi-airbag support device for optical elements in lithography projection objective lens system

Abstract

The optical element multi-airbag support device in the lithography projection objective lens system belongs to the technical field of deep ultraviolet projection lithography objective lens assembly and adjustment. In order to solve the problems of the existing optical element detection device that have a large impact on the lens surface shape and uneven support force, the The device includes an optical element, multiple airbags, a base, an inflatable tube and an adapter; the optical element is placed on the multiple airbags; the multiple airbags are evenly distributed along the circumference of the base; the airbag is connected to the inflatable tube through the adapter The air bag includes an air bag, two rows of threaded holes are arranged on both sides of the bottom, and air inlet holes are arranged at the bottom; the base includes long holes, screw holes, weight-reducing holes and grooves; the air inlet holes of the air bag extend into the long holes of the base The threaded hole at the bottom of the airbag is connected with the screw hole on the base by screws; the weight-reducing hole is arranged in the circular area of ​​the center of the base; the groove is matched with the inflatable tube; effectively reducing the influence of the adjustment force on the surface shape of the optical element; The trefoil aberration and astigmatism that occur during mechanical clamping are avoided.

Description

technical field [0001] The invention relates to the technical field of deep ultraviolet projection lithography objective lens assembly and adjustment, in particular to a support device that can be used for optical elements in a lithography projection objective lens system. Background technique [0002] Projection lithography equipment is one of the core equipment in the large-scale integrated circuit manufacturing production line. Molecular laser projection lithography equipment has become the mainstream equipment for integrated circuit manufacturing at 90nm, 65nm and 45nm nodes. [0003] The structural design of the projection lithography objective lens and before and during the assembly process have high requirements for the repeatability of the optical element inspection, and the optical element needs to be as uniform as possible in the process of being supported by the inspected tooling, so as to be less affected by the supporting force, and at the same time Minor adjus...

AI Technical Summary

Problems solved by technology

[0004] The present invention provides a multi-airbag support device for optical elements in a lithographic projection objective lens system to solve the problems of a large influence on the surface shape of the optical element and uneven support force in the existing rigid clamping method in the optical element detection device.

Images