Array substrate, manufacturing method thereof, and display device
A technology of an array substrate and a manufacturing method, which is applied in the display field, can solve the problems of abnormal loudness electrode signals, affecting the display effect, and the interference of data lines to pixel electrodes, so as to reduce the interference, improve the display effect, and reduce the interlayer capacitance.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0057] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.
[0058] An embodiment of the present invention provides an array substrate, such as Figure 3-Figure 9 As shown, it includes a gate insulating layer 7, a pixel electrode layer 8, and a data line metal layer arranged on a base substrate, wherein the data line metal layer includes a data line 4, and the pixel electrode layer includes a pixel electrode 5; the gate insulating layer 7 corresponds to The thickness of the region between the pixel electrode 5 and the data line 4 is smaller than the thickness of the region of the gate insulating layer 7 corresponding to the pixel electrode 5 and / or the thickness of the region of the gate insulating layer 7 corresponding to the ...
PUM

Abstract
Description
Claims
Application Information

- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com