Cleaning method for dust-free duster

A technology of dust-free rags and rags, which is applied in the field of cleaning, and can solve problems such as inability to remove, recovery of clean rags, cross-contamination of clean rags, etc.
CN103422338BInactive Publication Date: 2015-04-22东莞市无极净化用品科技有限公司
6 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
东莞市无极净化用品科技有限公司
Publication Date
2015-04-22
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention provides a novel cleaning method for a dust-free duster, which comprises the following steps: soaking the duster in ultrapure water being subjected to filtration of ion-exchange resin, adding fatty alcohol polyglycol ether, alkyl-triglyceride-amide and sulfosuccinic acid solution, and meanwhile, conducting fabric refining and acid-base cleaning, drying and cooling, and dust-free detection. The cleaning method is the cleaning process summarized by years of innovative practice research of the company; according to the dust-free duster cleaned by the method, pollutants of organic and inorganic residues, liquid dust particles, zwitterions, and the like are almost cleared completely, so that dust-free cleaning requirements for dusters in various fields of semiconductor product line chips, microprocessors, semiconductor assembly product lines, disc drivers, LCD display products, dust-free workplaces, and the like are completely satisfied; therefore, the method belongs to an innovation for the technical field of cleaning and processing of the dust-free dusters.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to the technical field of cleaning, in particular to a cleaning method for a dust-free rag. Background technique

[0002] In the prior art, the dust-free rag has a soft surface, is easy to wipe sensitive surfaces, does not lose fibers when rubbed, has good water absorption and cleaning effect, and is widely used in the following fields: semiconductor production line chips, microprocessors, semiconductor assembly production lines, discs Drivers, LCD display products, circuit board production lines, precision instruments, optical products, aviation industry, PCB products, medical equipment, dust-free workshops and many other fields. However, in the production process of the dust-free cloth, it is unavoidable to be polluted by silicone oil and ions, dust particles, organic matter, and inorganic residues. This kind of cleaning cannot completely clean the dust-free rag, especially the oil, pollution residue, liquid dust particles, ani...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More