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A High Electron Mobility Transistor

A high electron mobility, transistor technology, applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of shortening the service life of devices, burning devices, reducing current output capability and additional power efficiency, etc., to ensure reliability and high The effect of thermal conductivity

Inactive Publication Date: 2016-11-23
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

A slight self-heating effect will lead to a reduction in the current output capability and additional power efficiency, as well as a decrease in the transconductance of the output terminal, which will lead to a serious degradation of the radio frequency and microwave performance of the device; a severe self-heating effect will also cause the function of the device to fail and shorten the life of the device. service life or even burn the device

Method used

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  • A High Electron Mobility Transistor
  • A High Electron Mobility Transistor
  • A High Electron Mobility Transistor

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] The schematic diagram of the structure of the high electron mobility transistor in this embodiment is as follows Figure 4 As shown, the substrate is made of silicon carbide material with a thickness of 70 microns; an aluminum nitride layer with a thickness of 10 microns is epitaxially grown on the substrate as a nucleation layer; a gallium nitride layer with a thickness of 2 microns is epitaxially grown on the aluminum nitride layer , as a channel layer; then epitaxially grow an AlGaN barrier layer with a thickness of 25 nanometers on the GaN layer; source, gate, drain, source and gate, and gate and drain between The passivation layers are respectively located on the AlGaN barrier layer, wherein the passivation layer is made of silicon nitride material; a high thermal conductivity material layer of diamond is arranged between both sides of the gate and the silicon nitride passivation layer with a thickness of 0.4 microns.

[0019] The finite element software is used to...

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Abstract

The invention belongs to the field of semiconductor devices, in particular to a transistor with high electron mobility. Optimized design for the self-heating effect of gallium nitride-based high electron mobility transistors. The technical solution is: a high electron mobility transistor, including a substrate, a nucleation layer grown sequentially above the substrate, a channel layer, and a barrier layer, and the source, gate, drain, source and gate and the passivation layer between the gate and the drain on the barrier layer; it is characterized in that, between the gate and the passivation layer A high thermal conductivity material layer is provided, and the high thermal conductivity material layer is in contact with the barrier layer. The present invention conducts the thermal energy of the active area near the gate to the surface of the device through the material layer with high thermal conductivity, thereby effectively reducing the temperature of the active area of ​​the device, realizing the reduction of the channel temperature of the device, and improving the electrical characteristics of the device, so that the device can It works normally at higher temperature and higher power, improving the reliability of the device.

Description

technical field [0001] The invention belongs to the field of semiconductor devices, in particular to a transistor with high electron mobility. Background technique [0002] High electron mobility transistor devices (compound semiconductor devices), due to their high electron saturation velocity, high breakdown voltage, and high electron mobility, make them suitable for applications in various fields such as high temperature, high frequency, radiation resistance, and high power. One of the semiconductor devices with the most application potential in microwave and microwave applications. Among the existing high electron mobility transistor devices, gallium nitride-based high electron mobility transistors have received extensive attention and research because of their excellent performance. [0003] At present, aluminum gallium nitride / gallium nitride (AlGaN / GaN) heterojunction high electron mobility transistor (HEMT) is commonly used as a GaN-based high electron mobility tran...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/778
Inventor 周伟吴杰刘绍斌
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA