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A light-transmitting heat-insulating film and its manufacturing method

A manufacturing method and technology of thermal insulation film, which are applied in the directions of ion implantation plating, coating, layered products, etc., can solve the problems of reduced brightness and blocking in the interior space of commercial buildings, and achieve thermal insulation effect and good light transmittance. The result of increased deposition rates and better overall performance

Inactive Publication Date: 2016-06-29
HANGZHOU ZEAL SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in addition to blocking the infrared part of sunlight, the heat insulation film will also block the visible light of sunlight, resulting in a reduction in the brightness of the interior space of commercial buildings

Method used

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  • A light-transmitting heat-insulating film and its manufacturing method
  • A light-transmitting heat-insulating film and its manufacturing method
  • A light-transmitting heat-insulating film and its manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] To manufacture light-transmitting and heat-insulating film, the steps are as follows:

[0051] (1) Provide the substrate, which is a carbon fiber film;

[0052] (2) Physical vapor deposition (PVD) is used to deposit a titanium layer on the surface of the substrate. The deposition temperature is 80°C and the deposition time is 1h. During the deposition process, a vertical direction control electric field is applied to the deposition surface so that the titanium layer grains arranged in vertical strips;

[0053] (3) Depositing a titanium nitride layer on the surface of the titanium layer by a physical vapor deposition process;

[0054] (4) drying the semi-finished product obtained in step (3), the drying temperature is 80°C, and the drying time is 2-3h;

[0055] (5) Depositing a nickel oxide coating layer on the titanium nitride layer by using a bias magnetron sputtering method;

[0056] (6) drying the semi-finished product obtained in step (5), the drying temperature ...

Embodiment 2

[0064] To manufacture light-transmitting and heat-insulating film, the steps are as follows:

[0065] (1) Provide the substrate, which is a carbon fiber film;

[0066] (2) Physical vapor deposition (PVD) is used to deposit a titanium layer on the surface of the substrate. The deposition temperature is 80°C and the deposition time is 1h. During the deposition process, a vertical direction control electric field is applied to the deposition surface so that the titanium layer grains arranged in vertical strips;

[0067] (3) Depositing a titanium nitride layer on the surface of the titanium layer by a physical vapor deposition process;

[0068] (4) drying the semi-finished product obtained in step (3), the drying temperature is 80°C, and the drying time is 2-3h;

[0069] (5) Depositing a nickel oxide coating layer on the titanium nitride layer by using a bias magnetron sputtering method;

[0070] (6) drying the semi-finished product obtained in step (5), the drying temperature ...

Embodiment 3

[0079] To manufacture light-transmitting and heat-insulating film, the steps are as follows:

[0080] (1) Provide the substrate, which is a carbon fiber film;

[0081] (2) Physical vapor deposition (PVD) is used to deposit a titanium layer on the surface of the substrate. The deposition temperature is 100°C and the deposition time is 1h. During the deposition process, a vertical direction control electric field is applied to the deposition surface so that the titanium layer grains arranged in vertical strips;

[0082] (3) Depositing a titanium nitride layer on the surface of the titanium layer by a physical vapor deposition process;

[0083] (4) drying the semi-finished product obtained in step (3), the drying temperature is 100° C., and the drying time is 3 hours;

[0084] (5) Depositing a nickel oxide coating layer on the titanium nitride layer by using a bias magnetron sputtering method;

[0085] (6) drying the semi-finished product obtained in step (5), the drying tempe...

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Abstract

The invention provides a method for manufacturing an electrostatically adhered heat-insulating film with excellent light transmission performance, high infrared and ultraviolet reflectance, simple manufacturing process, and durability. It is realized by superimposing various functional layers on the provided substrate layer.

Description

technical field [0001] The invention relates to a light-transmitting heat-insulating film and a manufacturing method thereof. Background technique [0002] The main function of the insulation film is to hinder the transfer of heat. Insulation film is not only widely used in various vehicles, but also in buildings. According to statistics, in general commercial buildings, electricity consumption related to air conditioning accounts for about 47% of the total electricity consumption. Therefore, reducing the electricity demand for air-conditioning is a very important issue for saving building operating costs. [0003] The infrared part of sunlight is the most important heat source in nature. After sunlight (especially the infrared part) enters the interior of the commercial building, the indoor temperature will increase. In order to reduce the solar radiation entering the building, thermal insulation films are generally attached to the windows of the commercial building. Ho...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B32B9/04B32B15/09B32B15/14B32B27/36C23C14/22C23C14/35
Inventor 葛敏军
Owner HANGZHOU ZEAL SCI & TECH
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